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Fowler–Nordheim hole tunneling in p-SiC/SiO2 structures

Appl. Phys. Lett. 77, 2560 (2000); doi:10.1063/1.1318229

Issue Date: 16 October 2000

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R. K. Chanana, K. McDonald, M. Di Ventra, S. T. Pantelides, and L. C. Feldman
Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235

G. Y. Chung, C. C. Tin, and J. R. Williams
Physics Department, Auburn University, Alabama 36801

R. A. Weller
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, Tennessee 37235
We report the confirmed occurrence of Fowler–Nordheim hole tunneling in p-4H–SiC metal-oxide-semiconductor capacitor structures. The effective mass for holes in the oxide is found to be in the range of 0.35m–0.52m, where m is the free electron mass. ©2000 American Institute of Physics.
History: Received 15 June 2000; accepted 19 August 2000
Permalink: http://link.aip.org/link/?APPLAB/77/2560/1
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KEYWORDS and PACS

Keywords
PACS
  • 73.40.Qv
    Electronic structure and electrical properties of surfaces, interfaces, and thin films Electronic transport in interface structures Metal–insulator–semiconductor structures (including semiconductor-to-insulator)
  • 73.40.Gk
    Electronic structure and electrical properties of surfaces, interfaces, and thin films Electronic transport in interface structures Tunneling
  • 73.20.-r
    Electronic structure and electrical properties of surfaces, interfaces, and thin films Surface and interface electron states
  • 85.30.Tv
    Electronic and magnetic devices; microelectronics Semiconductor devices Field effect devices
  • 71.18.+y
    Electronic structure Fermi surface: calculations and measurements; effective mass, g factor
  • YEAR: 2000

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (14)

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