Microcathodoluminescence of impurity doping at gallium nitride/sapphire interfaces
Appl. Phys. Lett. 78, 3630 (2001); doi:10.1063/1.1377858
Issue Date: 4 June 2001
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We have used low-temperature cathodoluminescence spectroscopy (CLS) to probe the spatial distribution and energies of electronic defects near GaN/Al2O3 interfaces grown by hydride vapor phase epitaxy (HVPE). Cross sectional secondary electron microscopy CLS shows systematic variations in impurity/defect emissions over a wide range of HVPE GaN/Sapphire electronic properties. These data, along with electrochemical capacitancevoltage profiling and secondary ion mass spectrometry, provide a consistent picture of near-interface doping by O diffusion from Al2O3 into GaN, over a range 1001000 nm. ©2001 American Institute of Physics.
| History: | Received 21 February 2001; accepted 17 April 2001 |
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KEYWORDS and PACS
gallium compounds,
sapphire,
interface states,
semiconductor-insulator boundaries,
III-V semiconductors,
wide band gap semiconductors,
cathodoluminescence,
defect states,
chemical interdiffusion,
scanning electron microscopy,
capacitance,
secondary ion mass spectra,
semiconductor epitaxial layers,
excitons
- 73.20.Hb
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electron states at surfaces and interfaces Impurity and defect levels; energy states of adsorbed species - 73.40.Qv
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport in interface structures Metalinsulatorsemiconductor structures (including semiconductor-to-insulator) - 78.60.Hk
Optical properties, condensed-matter spectroscopy and other interactions of radiation and particles with condensed matter Other luminescence and radiative recombination Cathodoluminescence, ionoluminescence - 68.35.Fx
Surfaces and interfaces; thin films and low-dimensional systems (structure and nonelectronic properties) Solid surfaces and solid-solid interfaces: Structure and energetics Diffusion; interface formation - 71.35.Gg
Electronic structure of bulk materials Excitons and related phenomena Exciton-mediated interactions - 71.55.Eq
Electronic structure of bulk materials Impurity and defect levels IIIV semiconductors - YEAR: 2001
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (17)
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- W. Götz, J. Walker, L. T. Romano, N. M. Johnson, and R. J. Molnar, Mater. Res. Soc. Symp. Proc. 449, 525 (1997).
- D. C. Look and R. J. Molnar, Appl. Phys. Lett. 70, 3377 (1997).
- X. L. Xu, C. D. Beling, S. Fung, Y. W. Zhao, N. F. Sun, T. N. Sun, Q. L. Zhang, H. H. Zhan, B. Q. Sun, J. N. Wang, W. K. Ge, and P. C. Wong, Appl. Phys. Lett. 76, 152 (2000).
- G. Popovici, W. Kim, A. Botchkarev, H. Tang, H. Morkoc, and J. Solomon, Appl. Phys. Lett. 71, 3385 (1997).
- J. E. Van Nostrand, J. Solomon, A. Saxler, Q.-H. Xie, D. C. Reynolds, and D. C. Look, J. Appl. Phys. 87, 8766 (2000).
- M. Godlewski, E. M. Goldys, M. R. Phillips, R. Langer, and A. Barski,
Appl. Phys. Lett. 73, 3686 (1998) . - R. A. Youngman and J. H. Harris,
J. Am. Ceram. Soc. 73, 3238 (1990) . - K. Uchida, A. Watanabe, F. Yano, M. Kouguchi, T. Tanaka, and S. Minagawa, J. Appl. Phys. 79, 3487 (1996).
- J. I. Pankove and J. A. Hutchby, J. Appl. Phys. 47, 5387 (1976).
- S. Gu, R. Zhang, J. Sun, L. Zhang, and T. F. Kuech, Appl. Phys. Lett. 76, 3454 (2000).
- B. K. Meyer, D. Volm, A. Graber, H. C. Alt, T. Detchprohm, A. Amano, and I. Akasaki,
Solid State Commun. 95, 597 (1995) . - Chas. Evans and Associates, 810 Kaifer Rd., Sunnyvale, California.
- D. C. Look, C. E. Stutz, R. J. Molnar, K. Saarinen, and Z. Liliental-Weber,
Solid State Commun. 117, 571 (2001) . - B. Arnaudov, T. Paskova, E. M. Goldys, R. Yakimova, S. Evtimova, I. G. Ivanov, A. Henry, and B. Monemar, J. Appl. Phys. 85, 7888 (1999).
- M. Leroux, N. Grandjean, B. Beaumont, G. Nataf, F. Semond, J. Massies, and P. Gibart, J. Appl. Phys. 86, 3721 (1999).
- A. P. Young, J. Schafer, L. J. Brillson, Y. Yang, S. H. Xu, H. Cruguel, G. J. Lapeyre, M. A. L. Johnson, and J. F. Schetzina,
J. Electron. Mater. 28, 308 (1999) . - N. Grandjean, J. Massies, and M. Leroux, Appl. Phys. Lett. 69, 2071 (1996).







