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Sputtered nanodots: A costless method for inducing effective pinning centers in superconducting thin films

Appl. Phys. Lett. 79, 4547 (2001); doi:10.1063/1.1428632

Issue Date: 31 December 2001

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A. Crisan
Nanoelectronics Research Institute of AIST, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki, 305-8568 Japan
National Institute for Materials Physics, P.O. Box MG-7, 76900 Bucharest, Romania


S. Fujiwara
Nanoelectronics Research Institute of AIST, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki, 305-8568 Japan
Science University of Tokyo, 2641 Yamazaki, Noda, Chiba, Japan


J. C. Nie, A. Sundaresan, and H. Ihara
Nanoelectronics Research Institute of AIST, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki, 305-8568 Japan
Core Research for Evolutional Science and Technology of the Japan Science and Technology Corporation, Kawaguchi, Saitama 332-0012, Japan

A straightforward and cheap method for creating extended defects, strong pinning centers, in superconducting thin films is proposed. Clearly, by very short time (3–5 s) rf sputtering at suitable substrate temperatures, we deposited Ag nanodots on SrTiO3 substrates prior to the growth of superconducting thin films. The nanodots were studied by atomic force microscopy. Due to the lattice mismatch and/or chemical poisoning, on top of the nanodots the superconducting phase does not form, creating in this way extended and effective pinning centers which increase the critical current density of the film. The method was applied to (Cu, Tl)BaSrCa2Cu3Oy films grown by amorphous phase epitaxy. Thin films grown in similar conditions, with and without nanodots, were characterized by x-ray diffraction and ac susceptibility. The results show that the nanodots increased the critical current density more than one order of magnitude. ©2001 American Institute of Physics.
History: Received 22 August 2001; accepted 30 October 2001
Permalink: http://link.aip.org/link/?APPLAB/79/4547/1
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KEYWORDS and PACS

Keywords
PACS
  • 74.76.Bz
    Superconductivity Superconducting films High-Tc films
  • 74.60.Ge
    Superconductivity Type-II superconductivity Flux pinning, flux creep, and flux-line lattice dynamics
  • 74.72.Fq
    Superconductivity High-Tc compounds Tl-based cuprates
  • 68.65.Hb
    Surfaces and interfaces; thin films and low-dimensional systems (structure and nonelectronic properties) Low-dimensional, mesoscopic, and nanoscale systems: structure and nonelectronic properties Quantum dots
  • 68.55.Ln
    Surfaces and interfaces; thin films and low-dimensional systems (structure and nonelectronic properties) Thin film structure and morphology Defects and impurities: doping, implantation, distribution, concentration, etc.
  • 74.25.Ha
    Superconductivity General properties; correlations between physical properties in normal and superconducting states Magnetic properties
  • 74.60.Jg
    Superconductivity Type-II superconductivity Critical currents
  • 81.07.Ta
    Materials science Nanoscale materials and structures: fabrication and characterization Quantum dots
  • 81.15.Cd
    Materials science Methods of deposition of films and coatings; film growth and epitaxy Deposition by sputtering
  • YEAR: 2001

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ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (6)

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