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Observation of the Mott–Gurney law in tris (8-hydroxyquinoline) aluminum films

Appl. Phys. Lett. 80, 1198 (2002); doi:10.1063/1.1449527

Issue Date: 18 February 2002

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M. Kiy, P. Losio, I. Biaggio, M. Koehler, A. Tapponnier, and P. Günter
Swiss Federal Institute of Technology Zürich, Nonlinear Optics Laboratory, Institute of Quantum Electronics, ETH Hönggerberg HPF E7, CH-8093 Zürich, Switzerland
We show that tris (8-hydroxyquinoline) aluminum (Alq3) thin films produced and characterized under ultrahigh vacuum conditions present a well-defined squared-law dependence of the injected current on the applied voltage at applied electric fields of the order of 0.25–1 MV/cm. From this, one derives an electric-field-independent electron mobility of the order of 10–7 cm2/(V s), with a variation between different samples of about one order of magnitude. Observations of current–voltage characteristics with clear indications of trap-filling and space-charge-limited conduction at high fields in Alq3 excludes the existence of traps with an exponential distribution of trap energies, as is commonly assumed in amorphous materials. ©2002 American Institute of Physics.
History: Received 18 October 2001; accepted 10 December 2001
Permalink: http://link.aip.org/link/?APPLAB/80/1198/1
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KEYWORDS and PACS

Keywords
PACS
  • 73.61.Ng
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electrical properties of specific thin films Insulators
  • 81.05.Lg
    Materials science Specific materials: fabrication, treatment, testing and analysis Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials
  • 73.50.Fq
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films High-field and nonlinear effects
  • 73.50.Gr
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films Charge carriers: generation, recombination, lifetime, trapping, mean free paths
  • YEAR: 2002

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ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (26)

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  1. M. A. Lampert and P. Mark, Current Injection in Solids (Academic, New York, 1970).
  2. J. H. Schön, C. Kloc, R. A. Laudise, and B. Batlogg, Appl. Phys. Lett. 73, 3574 (1998).
  3. J. H. Schön, C. Kloc, R. A. Laudise, and B. Batlogg, Phys. Rev. B 58, 12952 (1998).
  4. M. A. Lampert, Phys. Rev. 103, 1648 (1956).
  5. M. A. Lampert, Proc. IRE 50, 1781 (1962).
  6. N. F. Mott and R. W. Gurney, Electronic Processes in Ionic Crystals (Oxford University Press, New York, 1940).
  7. A. Rose, Phys. Rev. 97, 1538 (1954).
  8. W. Brütting, S. Berleb, and A. G. Mückl, Org. Electr. 2, 1 (2001).
  9. I. H. Campbell and D. L. Smith, Appl. Phys. Lett. 74, 561 (1999).
  10. M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, and A. Winnacker, Appl. Phys. Lett. 76, 115 (2000).
  11. J. Staudigel, M. Stössel, F. Steuber, J. Blässing, and J. Simmerer, Synth. Met. 111–112, 69 (2000).
  12. M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, A. Winnacker, H. Neuner, D. Metzdorf, H.-H. Johannes, and W. Kowalsky, Synth. Met. 111–112, 19 (2000).
  13. W. Brütting, S. Berleb, and A. G. Mückl, Synth. Met. 122, 99 (2001).
  14. H. Heil, J. Steiger, S. Karg, M. Gastel, H. Ortner, H. von Seggern, and M. Stössel, J. Appl. Phys. 89, 420 (2001).
  15. S. Berleb, A. G. Mückl, W. Brütting, and M. Schwoerer, Synth. Met. 111–112, 341 (2000).
  16. S. Barth, P. Müller, H. Riel, P. F. Seidler, W. Riess, H. Vestweber, U. Wolf, and H. Bässler, Synth. Met. 111–112, 327 (2000).
  17. U. Wolf, S. Barth, and H. Bässler, Appl. Phys. Lett. 75, 2035 (1999).
  18. M. Kiy, I. Gamboni, U. Suhner, I. Biaggio, and P. Günter, Synth. Met. 111–112, 307 (2000).
  19. M. Kiy, I. Biaggio, and P. Günter, Nonlinear Opt. 25, 461 (2001).
  20. M. Kiy, I. Gamboni, I. Biaggio, and P. Günter, Proc. SPIE 4105, 291 (2001).
  21. C. Shen, I. G. Hill, and A. Kahn, Adv. Mater. 11, 1523 (1999).
  22. R. G. Kepler, P. M. Beeson, S. J. Jacobs, R. A. Anderson, M. B. Sinclair, V. S. Valencia, and P. A. Cahill, Appl. Phys. Lett. 66, 3618 (1995).
  23. B. Chen and S. Liu, Synth. Met. 91, 169 (1997).
  24. S. Barth, P. Müller, H. Riel, P. F. Seidler, W. Riess, H. Vestweber, and H. Bässler, J. Appl. Phys. 89, 3711 (2001).
  25. S. Hayashi, T. T. Wang, S. Matsuoka, and S. Saito, Mol. Cryst. Liq. Cryst. 135, 355 (1986).
  26. D. Ma, I. A. Hummelgen, B. Hu, F. E. Karasz, X. Jing, L. Wang, and F. Wang, Solid State Commun. 112, 251 (1999).

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