Phosphorous
-doping layers were fabricated in silicon by PH3 deposition at room temperature, followed by low-temperature Si epitaxy. Scanning tunneling microscope images indicate large H coverage, and regions of c(2×2) structure. Hall data imply full carrier activation with mobility <40 cm2/V s when the surface coverage is
0.2 ML. Conductivity measurements show a ln(T) behavior at low temperatures, characteristic of a high-density two-dimensional conductor. Possible future applications to atom-scale electronics and quantum computation are briefly discussed. ©2002 American Institute of Physics.
-doping layers were fabricated in silicon by PH3 deposition at room temperature, followed by low-temperature Si epitaxy. Scanning tunneling microscope images indicate large H coverage, and regions of c(2×2) structure. Hall data imply full carrier activation with mobility <40 cm2/V s when the surface coverage is
0.2 ML. Conductivity measurements show a ln(T) behavior at low temperatures, characteristic of a high-density two-dimensional conductor. Possible future applications to atom-scale electronics and quantum computation are briefly discussed. ©2002 American Institute of Physics.
| History: | Received 28 November 2001; accepted 3 January 2002 |
| Permalink: |
http://link.aip.org/link/?APPLAB/80/1580/1 |
ERRATUM
- Erratum: "Ultradense phosphorous delta layers grown into silicon from PH3 molecular precursors" [Appl. Phys. Lett. 80, 1580 (2002)]
T.-C. Shen et al.
Appl. Phys. Lett. 80, 3231 (2002)
KEYWORDS and PACS
silicon,
elemental semiconductors,
phosphorus,
doping profiles,
semiconductor doping,
semiconductor epitaxial layers,
carrier mobility,
two-dimensional electron gas,
scanning tunnelling microscopy,
Hall effect,
electrical conductivity
- 61.72.Tt
Structure of solids and liquids; crystallography Defects and impurities in crystals; microstructure Doping and impurity implantation in germanium and silicon - 85.40.Ry
Electronic and magnetic devices; microelectronics Microelectronics: LSI, VLSI, ULSI; integrated circuit fabrication technology Impurity doping, diffusion and ion implantation technology - 81.05.Cy
Materials science Specific materials: fabrication, treatment, testing and analysis Elemental semiconductors - 73.61.Cw
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electrical properties of specific thin films Elemental semiconductors - 71.55.Cn
Electronic structure of bulk materials Impurity and defect levels Elemental semiconductors - 72.80.Cw
Electronic transport in condensed matter Conductivity of specific materials Elemental semiconductors - 61.72.Ss
Structure of solids and liquids; crystallography Defects and impurities in crystals; microstructure Impurity concentration, distribution, and gradients - 73.50.Dn
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films Low-field transport and mobility; piezoresistance - 73.50.Jt
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films Galvanomagnetic and other magnetotransport effects (including thermomagnetic effects) - YEAR: 2002
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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