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Ultradense phosphorous delta layers grown into silicon from PH3 molecular precursors

Appl. Phys. Lett. 80, 1580 (2002); doi:10.1063/1.1456949

Issue Date: 4 March 2002 | See: Erratum

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T.-C. Shen and J.-Y. Ji
Department of Physics, Utah State University, Logan, Utah 84322

M. A. Zudov and R.-R. Du
Department of Physics, University of Utah, Salt Lake City, Utah 84112

J. S. Kline and J. R. Tucker
Department of Electrical and Computer Engineering, University of Illinois, Urbana, Illinois 61801
Phosphorous delta-doping layers were fabricated in silicon by PH3 deposition at room temperature, followed by low-temperature Si epitaxy. Scanning tunneling microscope images indicate large H coverage, and regions of c(2×2) structure. Hall data imply full carrier activation with mobility <40 cm2/V s when the surface coverage is <~0.2 ML. Conductivity measurements show a ln(T) behavior at low temperatures, characteristic of a high-density two-dimensional conductor. Possible future applications to atom-scale electronics and quantum computation are briefly discussed. ©2002 American Institute of Physics.
History: Received 28 November 2001; accepted 3 January 2002
Permalink: http://link.aip.org/link/?APPLAB/80/1580/1
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ERRATUM

  1. Erratum: "Ultradense phosphorous delta layers grown into silicon from PH3 molecular precursors" [Appl. Phys. Lett. 80, 1580 (2002)]
    T.-C. Shen et al.
    Appl. Phys. Lett. 80, 3231 (2002)

KEYWORDS and PACS

Keywords
PACS
  • 61.72.Tt
    Structure of solids and liquids; crystallography Defects and impurities in crystals; microstructure Doping and impurity implantation in germanium and silicon
  • 85.40.Ry
    Electronic and magnetic devices; microelectronics Microelectronics: LSI, VLSI, ULSI; integrated circuit fabrication technology Impurity doping, diffusion and ion implantation technology
  • 81.05.Cy
    Materials science Specific materials: fabrication, treatment, testing and analysis Elemental semiconductors
  • 73.61.Cw
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electrical properties of specific thin films Elemental semiconductors
  • 71.55.Cn
    Electronic structure of bulk materials Impurity and defect levels Elemental semiconductors
  • 72.80.Cw
    Electronic transport in condensed matter Conductivity of specific materials Elemental semiconductors
  • 61.72.Ss
    Structure of solids and liquids; crystallography Defects and impurities in crystals; microstructure Impurity concentration, distribution, and gradients
  • 73.50.Dn
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films Low-field transport and mobility; piezoresistance
  • 73.50.Jt
    Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport phenomena in thin films Galvanomagnetic and other magnetotransport effects (including thermomagnetic effects)
  • YEAR: 2002

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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