We have fabricated single-wall carbon nanotube field-effect transistors (CNFETs) in a conventional metaloxidesemiconductor field-effect transistor (MOSFET) structure, with gate electrodes above the conduction channel separated from the channel by a thin dielectric. These top gate devices exhibit excellent electrical characteristics, including steep subthreshold slope and high transconductance, at gate voltages close to 1 Va significant improvement relative to previously reported CNFETs which used the substrate as a gate and a thicker gate dielectric. Our measured device performance also compares very well to state-of-the-art silicon devices. These results are observed for both p- and n-type devices, and they suggest that CNFETs may be competitive with Si MOSFETs for future nanoelectronic applications. ©2002 American Institute of Physics.
| History: | Received 24 January 2002; accepted 3 April 2002 |
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http://link.aip.org/link/?APPLAB/80/3817/1 |
ERRATUM
- Erratum: "Vertical scaling of carbon nanotube field-effect transistors using top gate electrodes" [Appl. Phys. Lett. 80, 3817 (2002)]
S. J. Wind et al.
Appl. Phys. Lett. 81, 1359 (2002)
KEYWORDS and PACS
- 85.35.Kt
Electronic and magnetic devices; microelectronics Nanoelectronic devices Nanotube devices - 85.30.Tv
Electronic and magnetic devices; microelectronics Semiconductor devices Field effect devices - 73.63.Fg
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport in mesoscopic or nanoscale materials and structures Nanotubes - YEAR: 2002
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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