Conditions for ohmic electron injection at the Mg/Alq3 interface
Appl. Phys. Lett. 80, 4366 (2002); doi:10.1063/1.1484558
Issue Date: 10 June 2002
You are not logged in to this journal. Log in
We show that the contacts formed by magnesium on tris (8-hydroxyquinoline) aluminum (Alq3) are intrinsically ohmic when they are fabricated and operated in ultrahigh vacuum. Under the same conditions, the injected current shows a steep increase approximately proportional to the seventh power of the applied voltage that we assign to trap filling. Only a subsequent contact with oxygen leads to an injection-limited behavior, where the observed steep current increase is caused by potential barriers at the contacts. In addition, we observe that electron injection in oxidized structures can be very well described by FowlerNordheim tunneling in the case when electrons are injected from the magnesium (Mg) contact evaporated onto Alq3. ©2002 American Institute of Physics.
| History: | Received 11 March 2002; accepted 19 April 2002 |
| Permalink: |
http://link.aip.org/link/?APPLAB/80/4366/1 |
KEYWORDS and PACS
- 73.40.Ns
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport in interface structures Metalnonmetal contacts - 73.40.Gk
Electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures Electronic transport in interface structures Tunneling - YEAR: 2002
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (17)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- S. Barth, U. Wolf, H. Bässler, P. Müller, H. Riel, H. Vestweber, P. F. Seidler, and W. Riess, Phys. Rev. B 60, 8791 (1999).
- U. Wolf, S. Barth, and H. Bässler, Appl. Phys. Lett. 75, 2035 (1999).
- I. H. Campbell and D. L. Smith, Appl. Phys. Lett. 74, 561 (1999).
- S. Barth, P. Müller, H. Riel, P. F. Seidler, W. Riess, H. Vestweber, U. Wolf, and H. Bässler,
Synth. Met. 111112, 327 (2000) . - S. Berleb, A. G. Mückl, W. Brütting, and M. Schwoerer,
Synth. Met. 111112, 341 (2000) . - M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, and A. Winnacker, Appl. Phys. Lett. 76, 115 (2000).
- M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, A. Winnacker, H. Neuner, D. Metzdorf, H.-H. Johannes, and W. Kowalsky,
Synth. Met. 111112, 19 (2000) . - M. A. Baldo and S. R. Forrest, Phys. Rev. B 64, 085201/1 (2001).
- W. Brütting, S. Berleb, and A. G. Mückl,
Synth. Met. 122, 99 (2001) . - W. Brütting, S. Berleb, and A. G. Mückl, Org. Electr. 2, 1 (2001).
- H. Heil, J. Steiger, S. Karg, M. Gastel, H. Ortner, H. von Seggern, and M. Stössel, J. Appl. Phys. 89, 420 (2001).
- M. Kiy, I. Gamboni, I. Biaggio, and P. Günter,
Proc. SPIE 4105, 290 (2001) . - M. Kiy, P. Losio, I. Biaggio, M. Koehler, A. Tapponnier, and P. Günter, Appl. Phys. Lett. 80, 1198 (2002).
- C. Shen, A. Kahn, and J. Schwartz, J. Appl. Phys. 89, 449 (2001).
- G. Horowitz, D. Fichou, X. Peng, and P. Delannoy,
J. Phys. (France) 51, 1489 (1990) . - P. Delannoy, Eur. J. Appl. Math. 7, 13 (1981).
- V. I. Arkhipov, E. V. Emelianova, Y. H. Tak, and H. Bässler, J. Appl. Phys. 84, 848 (1998).


111





