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Far-infrared multilayer mirrors

Appl. Phys. Lett. 83, 4119 (2003); doi:10.1063/1.1627479

Issue Date: 17 November 2003

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Robert Schiwon, Gerhard Schwaab, Erik Bründermann, and Martina Havenith
Ruhr-Universität Bochum, Physikalische Chemie II-NC 7/72, D-44780 Bochum, Germany
We present a concept for highly reflecting broadband mirrors in the far-infrared. We report on the fabrication of dielectric multilayer mirrors consisting of 1–6 layers of silicon wafers with vacuum gaps in between. By comparison to gold mirrors, we can demonstrate the high reflectivity (>99%) over the frequency range between 40 and 130 cm–1. The measurements are in very good agreement with theoretical predictions. ©2003 American Institute of Physics.
History: Received 19 May 2003; accepted 22 September 2003
Permalink: http://link.aip.org/link/?APPLAB/83/4119/1
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KEYWORDS and PACS

Keywords
PACS
  • 42.79.Bh
    Optical lenses, prisms and mirrors
  • 42.82.Cr
    Optical fabrication techniques; lithography, pattern transfer (integrated optics)
  • 42.86.+b
    Optical workshop techniques
  • YEAR: 2003

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (13)
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