Valley splitting in strained silicon quantum wells
Appl. Phys. Lett. 84, 115 (2004); doi:10.1063/1.1637718
Issue Date: 5 January 2004
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A theory based on localized-orbital approaches is developed to describe the valley splitting observed in silicon quantum wells. The theory is appropriate in the limit of low electron density and relevant for quantum computing architectures. The valley splitting is computed for realistic devices using the quantitative nanoelectronic modeling tool NEMO. A simple, analytically solvable tight-binding model reproduces the behavior of the splitting in the NEMO results and yields much physical insight. The splitting is in general nonzero even in the absence of electric field in contrast to previous works. The splitting in a square well oscillates as a function of S, the number of layers in the quantum well, with a period that is determined by the location of the valley minimum in the Brillouin zone. The envelope of the splitting decays as S3. The feasibility of observing such oscillations experimentally in Si/SiGe heterostructures is discussed. ©2004 American Institute of Physics.
| History: | Received 15 August 2003; accepted 10 November 2003 |
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KEYWORDS and PACS
silicon,
elemental semiconductors,
semiconductor quantum wells,
interface states,
localised states,
electron density,
tight-binding calculations,
Brillouin zones,
band structure
- 73.21.Fg
Quantum wells (electron states/collective excitations) - 73.20.At
Surface states, band structure, electron density of states - 73.20.Fz
Weak or Anderson localization (surface/interface states) - 71.15.Ap
Basis sets (LCAO, plane-wave, APW, etc.) and related methodology (scattering methods, ASA, linearized methods, etc.) (condensed matter electronic structure) - YEAR: 2004
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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