Systematic study of the magnetization reversal in patterned Co and NiFe Nanolines
Appl. Phys. Lett. 84, 759 (2004); doi:10.1063/1.1645332
Issue Date: 2 February 2004
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We report a universal dependence of switching field of patterned magnetic nanolines as a function of the linewidth for Co and NiFe films of various thicknesses. This dependence is shown to be consistent with a nucleation picture in which the magnetization reversal is controlled only by a small nucleus equivalent to a particle with an aspect ratio of 1.25, which spreads across the width of the nanoline. Micromagnetic simulation, taking into account of the edge roughness, agrees well with the observed results. ©2004 American Institute of Physics.
| History: | Received 19 September 2003; accepted 5 December 2003 |
| Permalink: |
http://link.aip.org/link/?APPLAB/84/759/1 |
KEYWORDS and PACS
cobalt,
nickel alloys,
iron alloys,
magnetic thin films,
nanostructured materials,
magnetisation reversal,
micromagnetics,
switching,
nucleation,
magnetic structure,
magnetic hysteresis,
coercive force
- 75.60.Jk
Magnetization reversal mechanisms - 75.70.Ak
Magnetic properties of monolayers and thin films - 75.25.+z
Spin arrangements in magnetically ordered materials including neutron and spin-polarized electron studies, synchrotron-source X-ray scattering, etc - 75.60.Ej
Magnetization curves, hysteresis, Barkhausen and related effects - YEAR: 2004
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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