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Systematic study of the magnetization reversal in patterned Co and NiFe Nanolines

Appl. Phys. Lett. 84, 759 (2004); doi:10.1063/1.1645332

Issue Date: 2 February 2004

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W. Casey Uhlig and Jing Shi
Department of Physics, University of Utah, Salt Lake City, Utah 84112
We report a universal dependence of switching field of patterned magnetic nanolines as a function of the linewidth for Co and NiFe films of various thicknesses. This dependence is shown to be consistent with a nucleation picture in which the magnetization reversal is controlled only by a small nucleus equivalent to a particle with an aspect ratio of 1.25, which spreads across the width of the nanoline. Micromagnetic simulation, taking into account of the edge roughness, agrees well with the observed results. ©2004 American Institute of Physics.
History: Received 19 September 2003; accepted 5 December 2003
Permalink: http://link.aip.org/link/?APPLAB/84/759/1
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KEYWORDS and PACS

Keywords
PACS
  • 75.60.Jk
    Magnetization reversal mechanisms
  • 75.70.Ak
    Magnetic properties of monolayers and thin films
  • 75.25.+z
    Spin arrangements in magnetically ordered materials including neutron and spin-polarized electron studies, synchrotron-source X-ray scattering, etc
  • 75.60.Ej
    Magnetization curves, hysteresis, Barkhausen and related effects
  • YEAR: 2004

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ISSN:
0003-6951 (print)   1077-3118 (online)
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