Comparison of Fe/Schottky and Fe/Al2O3 tunnel barrier contacts for electrical spin injection into GaAs
Appl. Phys. Lett. 84, 4334 (2004); doi:10.1063/1.1758305
Published 7 May 2004
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We compare electrical spin injection from Fe films into identical GaAs-based light-emitting diodes (LEDs) using different tunnel barriersa reverse-biased Fe/AlGaAs Schottky contact and an Fe/Al2O3 barrier. Both types of structures are formed in situ using a multichamber molecular-beam epitaxy system. A detailed analysis of the transport data confirms that tunneling occurs in each case. We find that the spin polarization achieved in the GaAs using the Al2O3 barrier is 40% (best case; 30% typical), but the electrical efficiency is significantly lower than that of the Fe Schottky contact. ©2004 American Institute of Physics.
| History: | Received 5 February 2004; accepted 6 April 2004; published 7 May 2004 |
| Permalink: |
http://link.aip.org/link/?APPLAB/84/4334/1 |
KEYWORDS and PACS
iron,
alumina,
gallium arsenide,
III-V semiconductors,
aluminium compounds,
ferromagnetic materials,
magnetic epitaxial layers,
semimagnetic semiconductors,
semiconductor epitaxial layers,
tunnel diodes,
Schottky diodes,
light emitting diodes,
electroluminescence,
spin polarised transport,
semiconductor device models
- 85.60.Jb
Light-emitting devices - 85.30.Kk
Semiconductor junction diodes - 85.30.De
Semiconductor-device characterization, design, and modeling - 73.61.Ey
Electrical properties of IIIV semiconductors (thin films) - 78.66.Fd
Optical properties of IIIV semiconductors (thin films) - 73.30.+y
Surface double layers, Schottky barriers, and work functions - 72.25.Dc
Spin polarized transport in semiconductors - 72.25.Hg
Electrical injection of spin polarized carriers - YEAR: 2004
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (17)
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- Note: Even though the bias condition for both devices are almost identical, the voltage drop across the Schottky barrier and the Al2O3 barrier might be quite different, resulting in a difference in energy for the injected electrons.







