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Atom lithography of Fe

Appl. Phys. Lett. 85, 4493 (2004); doi:10.1063/1.1818347

Issue Date: 8 November 2004

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E. te Sligte, B. Smeets, K. M. R. van der Stam, R. W. Herfst, P. van der Straten, H. C. W. Beijerinck, and K. A. H. van Leeuwen
Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372  nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186  nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. ©2004 American Institute of Physics
History: Received 9 July 2004; accepted 13 September 2004
Permalink: http://link.aip.org/link/?APPLAB/85/4493/1
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KEYWORDS and PACS

Keywords
PACS
  • 75.50.Bb
    Ferromagnetism of Fe and its alloys
  • 85.40.Hp
    Lithography, masks and pattern transfer (microelectronics)
  • 61.46.+w
    Structure of nanoscale materials: clusters, nanoparticles, nanotubes, and nanocrystals
  • YEAR: 2004

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ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (18)
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