Phase-change recording medium that enables ultrahigh-density electron-beam data storage
Appl. Phys. Lett. 86, 051902 (2005); doi:10.1063/1.1856690
Published 25 January 2005
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An ultrahigh-density electron-beam-based data storage medium is described that consists of a diode formed by growing an InSe/GaSe phase-change bilayer film epitaxially on silicon. Bits are recorded as amorphous regions in the InSe layer and are detected via the current induced in the diode by a scanned electron beam. This signal current is modulated by differences in the electrical properties of the amorphous and crystalline states. The success of this recording scheme results from the remarkable ability of layered III-VI materials, such as InSe, to maintain useful electrical properties at their surfaces after repeated cycles of amorphization and recrystallization.
©2005 American Institute of Physics
| History: | Received 27 September 2004; accepted 13 December 2004; published 25 January 2005 |
| Permalink: |
http://link.aip.org/link/?APPLAB/86/051902/1 |
EPAPS
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KEYWORDS and PACS
gallium compounds,
indium compounds,
III-VI semiconductors,
amorphous semiconductors,
semiconductor epitaxial layers,
semiconductor storage,
charge storage diodes,
optical storage,
amorphous state,
amorphisation,
recrystallisation,
storage media,
data recording,
carrier mobility,
electron beam applications,
electron beam effects
- 85.30.Kk
Semiconductor junction diodes - 42.79.Vb
Optical storage systems, optical disks - 61.82.Fk
Radiation effects on semiconductors - 64.70.Kb
Solidsolid transitions - 81.30.Hd
Constant-composition solidsolid phase transformations: polymorphic, massive, and orderdisorder - 61.80.Fe
Electron and positron radiation effects - YEAR: 2005
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (20)
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