Electrically induced surface instability of a conductive thin film on a dielectric substrate
Appl. Phys. Lett. 87, 151911 (2005); doi:10.1063/1.2099526
Published 6 October 2005
You are not logged in to this journal. Log in
The stability of a conductive thin film on a dielectric substrate subjected to a transverse electric field and a residual strain is analyzed. Under a uniform electric field, an equilibrium state exists with a constant thickness reduction of the substrate. The equilibrium state, however, can be unstable, depending on the intensity of the electric field, the stiffness, and Poisson's ratio of the substrate, and on the residual strain in the film. Based on a linear perturbation analysis, the critical condition is determined, beyond which wrinkling of the film is expected.
©2005 American Institute of Physics
| History: | Received 5 July 2005; accepted 8 September 2005; published 6 October 2005 |
| Permalink: |
http://link.aip.org/link/?APPLAB/87/151911/1 |
KEYWORDS and PACS
thin films,
conducting materials,
dielectric materials,
substrates,
internal stresses,
elasticity,
Poisson ratio
- 77.84.-s
Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials - 77.55.+f
Dielectric thin films - 68.60.Bs
Mechanical and acoustical properties of thin films - 73.61.-r
Electrical properties of specific thin films - 81.40.Jj
Elasticity and anelasticity, stress-strain relations - 62.20.Dc
Elasticity, elastic constants - YEAR: 2005
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (17)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- M. Watanabe, H. Shirai, and T. Hirai, J. Appl. Phys. 92, 4631 (2002).
- R. Pelrine, R. Kornblush, J. Joseph, R. Heydt, Q. Pei, and S. Chiba,
Mater. Sci. Eng., C 11, 89 (2000) . - S. P. Lacour, S. Wagner, Z. Y. Huang, and Z. Suo, Appl. Phys. Lett. 82, 2404 (2003).
- E. Cerda and L. Mahadevan, Phys. Rev. Lett. 90, 074302 (2003).
- J. Groenewold,
Physica A 298, 32 (2001) . - Z. Y. Huang, W. Hong, and Z. Suo, Phys. Rev. E 70, 030601R (2004).
- R. Huang,
J. Mech. Phys. Solids 53, 63 (2005) . - S. Herminghaus, Phys. Rev. Lett. 83, 2359 (1999).
- E. Schaffer, T. Thurn-Albrecht, T. P. Russell, and U. Steiner,
Europhys. Lett. 53, 518 (2001) . - Z. Lin, T. Kerle, S. M. Baker, D. A. Hoagland, E. Schaffer, U. Steiner, and T. P. Russell, J. Chem. Phys. 114, 2377 (2001).
- R. Verma, A. Sharma, K. Kargupta, and J. Bhaumik,
Langmuir 21, 3710 (2005) . - L. Wu and S. Y. Chou,
J. Non-Newtonian Fluid Mech. 125, 91 (2005) . - E. Schaffer, T. Thurn-Albrecht, T. P. Russell, and U. Steiner,
Nature (London) 403, 874 (2000) . - S. Y. Chou, L. Zhang, and L. Guo, Appl. Phys. Lett. 75, 1004 (1999).
- S. Y. Chou and L. Zhang,
J. Vac. Sci. Technol. B 17, 3197 (1999) . - E. S. Hung and S. D. Senturia,
J. Microelectromech. Syst. 8, 497 (1999) . - R. Huang and Z. Suo,
Thin Solid Films 429, 273 (2003) .







