Top-emitting 230 dots/in. active-matrix polymer light-emitting diode displays on flexible metal foil substrates
Appl. Phys. Lett. 90, 151114 (2007); doi:10.1063/1.2722059
Published 11 April 2007
You are not logged in to this journal. Log in
A top-emitting 230 dots/in. monochrome active-matrix polymer light-emitting diode (PLED) display having the VGA format and fabricated on a flexible steel foil utilizing the polycrystalline silicon thin-film transistor (TFT) technology is reported. The pixel circuitry architecture consists of the conventional two TFT circuitries made of two p-channel metal-oxide-semiconductor (PMOS) transistors and one storage capacitor. The average field-effect hole mobility and threshold voltage of the PMOS polysilicon TFTs fabricated on the metal foil are 37(±4) cm2/V s and −1.9(±0.6) V, respectively. The light turn-on voltage of the PLED is 4.0 V.
©2007 American Institute of Physics
| History: | Received 22 December 2006; accepted 10 March 2007; published 11 April 2007 |
| Permalink: |
http://link.aip.org/link/?APPLAB/90/151114/1 |
KEYWORDS and PACS
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (19)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett. 51, 913 (1987).
- J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackay, R. H. Friend, and P. L. Holmes,
Nature (London) 347, 539 (1988) . - D. Braun and A. Heeger, Appl. Phys. Lett. 58, 1982 (1991).
- M. G. Hack, M. S. Weaver, J. K. Mahon, and J. J. Brown,
Proc. SPIE 4362, 245 (2001) . - G. Gustafsson, Y. Cao, G. M. Treacy, F. Klavetter, N. Colaneri, and A. J. Heeger,
Nature (London) 357, 477 (1992) . - S. D. Theiss and S. Wagner,
IEEE Electron Device Lett. 17, 578 (1996) . - M. Wu, K. Pangal, J. C. Sturm, and S. Wagner, Appl. Phys. Lett. 75, 2244 (1999).
- R. S. Howell, M. Stewart, S. V. Kamik, S. K. Saha, and M. K. Hatalis,
IEEE Electron Device Lett. 21, 70 (2000) . - T. Afentakis, M. Hatalis, A. T. Voutsas, and J. Hartzell,
IEEE Trans. Electron Devices 53, 815 (2006) . - C. C. Wu, S. D. Theiss, G. Gu, M. H. Lu, J. C. Sturm, S. Wagner, and S. R. Forrest,
IEEE Electron Device Lett. 18, 609 (1997) . - D. U. Jin, J. K. Jeong, H. S. Shin, M. K. Kim, T. K. Ahn, S. Y. Kwon, J. H. Kwack, T. W. Kim, Y. G. Mo, and H. K. Chung,
SID Int. Symp. Digest Tech. Papers 37, 1855 (2006) . - A. Chwang, R. Hewitt, K. Urbanik, J. Silvernail, K. Rajan, M. Hack, J. Brown, J.-P. Lu, C. Shin, J. Ho, R. Street, T. Ramos, L. Moro, N. Rutherford, K. Tognoni, B. Anderson, and D. Huffman,
SID Int. Symp. Digest Tech. Papers 37, 1858 (2006) . - M. Troccoli, A. J. Roudbari, T.-K. Chuang, and M. Hatalis,
Solid-State Electron. 50, 1080 (2006) . - J. Halls,
Inf. Disp. 21, 10 (2005) . - D. R. Baigent, R. N. Marks, N. C. Greenham, R. H. Friend, S. C. Moratti, and A. B. Holmes, Appl. Phys. Lett. 65, 2636 (1994).
- A. T. Voutsas, A. M. Marmorstein, and R. Solanki,
J. Electrochem. Soc. 146, 3500 (1999) . - S. K. Saha, R. S. Howell, and M. K. Hatalis, J. Appl. Phys. 86, 625 (1999).
- L. Ke, R. S. Kumar, P. Chen, L. Shen, S. J. Chua, and A. P. Burden,
IEEE Photonics Technol. Lett. 17, 543 (2005) . - J. C. C. Fan and J. B. Goodenough, J. Appl. Phys. 48, 3524 (1977).







