Valence band anticrossing in GaBixAs1−x
Appl. Phys. Lett. 91, 051909 (2007); doi:10.1063/1.2768312
Published 31 July 2007
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The optical properties of GaBixAs1−x(0.04<x<0.08) grown by molecular beam epitaxy have been studied by photomodulated reflectance spectroscopy. The alloys exhibit a strong reduction in the band gap as well as an increase in the spin-orbit splitting energy with increasing Bi concentration. These observations are explained by a valence band anticrossing model, which shows that a restructuring of the valence band occurs as the result of an anticrossing interaction between the extended states of the GaAs valence band and the resonant T2 states of the Bi atoms.
©2007 American Institute of Physics
| History: | Received 9 April 2007; accepted 12 July 2007; published 31 July 2007 |
| Permalink: |
http://link.aip.org/link/?APPLAB/91/051909/1 |
KEYWORDS and PACS
bismuth,
energy gap,
energy level crossing,
gallium arsenide,
III-V semiconductors,
impurity states,
reflectivity,
semiconductor epitaxial layers,
spin-orbit interactions,
valence bands
- 71.20.Nr
Electronic structure of crystalline semiconductor compounds - 71.55.Eq
Impurity and defect levels in III–V semiconductors - 71.70.Ej
Spin–orbit coupling, Zeeman and Stark splitting, Jahn–Teller effect (condensed matter) - 78.66.Fd
Optical properties of III–V semiconductors (thin films) - 68.55.-a
Thin film structure and morphology - YEAR: 2007
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (12)
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- W. Huang, K. Oe, G. Feng, and M. Yoshimoto, J. Appl. Phys. 98, 053505 (2005).
- S. Francoeur, M. J. Seong, A. Mascarenhas, S. Tixier, M. Adamcyk, and T. Tiedje, Appl. Phys. Lett. 82, 3874 (2003).
- S. Tixier, M. Adamcyk, T. Tiedje, S. Francoeur, A. Mascarenhas, P. Wei, and F. Schiettekatte, Appl. Phys. Lett. 82, 2245 (2003).
- J. Yoshida, T. Kita, O. Wada, and K. Oe,
Jpn. J. Appl. Phys., Part 1 42, 371 (2003) . - B. Fluegel, S. Francoeur, A. Mascarenhas, S. Tixier, E. C. Young, and T. Tiedje, Phys. Rev. Lett. 97, 067205 (2006).
- Y. Zhang, A. Mascarenhas, and L.-W. Wang, Phys. Rev. B 71, 155201 (2005).
- J. Wu, W. Walukiewicz, K. M. Yu, J. D. Denlinger, W. Shan, J. W. Ager III, A. Kimura, H. F. Tang, and T. F. Kuech, Phys. Rev. B 70, 115214 (2004).
- J. Wu, W. Walukiewicz, K. M. Yu, E. E. Haller, I. Miotkowski, A. K. Ramdas, Ching-Hau Su, I. K. Sou, R. C. C. Perera, and J. D. Denlinger, Phys. Rev. B 67, 035207 (2003).
- K. Alberi, J. Wu, W. Walukiewicz, K. M. Yu, O. D. Dubon, S. P. Watkins, C. X. Wang, X. Liu, Y.-J. Cho, and J. Furdyna, Phys. Rev. B 75, 045203 (2007).
- F. A. Trumbore, M. Gershenzon, and D. G. Thomas, Appl. Phys. Lett. 9, 4 (1966).
- K. Bertulis, A. Krotkus, G. Aleksejenko, V. Pacebutas, R. Adomavicius, G. Molis, and S. Marcinkevicius, Appl. Phys. Lett. 88, 201112 (2006).
- D. E. Aspnes,
Surf. Sci. 37, 418 (1973) .







