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Hot phonon effect on electron velocity saturation in GaN: A second look

Appl. Phys. Lett. 91, 252104 (2007); doi:10.1063/1.2824872

Published 17 December 2007

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Jacob Khurgin
Department of Electrical and Computer Engineering, John Hopkins University, Baltimore, Maryland 21218, USA

Yujie J. Ding
Department of Electrical and Computer Engineering, Lehigh University, Betlehem, Pennsylvania 18015, USA

Debdeep Jena
Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA
A theoretical model is developed for electron velocity saturation in high power GaN transistors. It is shown that electron velocity at high electric fields is reduced due to heating of electron gas since the high density of nonequilibrium LO phonons cannot efficiently transfer heat to the lattice. However, the resulting degradation of electron velocity is found to be weaker than previously reported. The results are compared with experimental data, and the ways to improve the efficiency of cooling the electron gas to increase the drift velocity are discussed. ©2007 American Institute of Physics
History: Received 1 October 2007; accepted 26 November 2007; published 17 December 2007
Permalink: http://link.aip.org/link/?APPLAB/91/252104/1
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KEYWORDS and PACS

Keywords
PACS
  • 85.30.Tv
    Semiconductor field effect devices
  • 85.30.De
    Semiconductor-device characterization, design, and modeling
  • 81.05.Ea
    III–V semiconductors: fabrication, treatment, testing and analysis
  • 73.61.Ey
    Electrical properties of III–V semiconductors (thin films)
  • 72.20.Fr
    Low-field transport and mobility; piezoresistance (semiconductors/insulators)
  • YEAR: 2007

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (8)

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