Tunneling spectroscopy of ultrathin insulating films: CuN on Cu(100)
Appl. Phys. Lett. 91, 253106 (2007); doi:10.1063/1.2825595
Published 18 December 2007
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Scanning tunneling microscopy is used to characterize the electronic structure of 1 ML films of CuN on Cu(100). We find that CuN acts as an insulator with a band gap that exceeds 4 eV. Measurements of the tunneling barrier height and image potential states indicate that the CuN work function is ~0.9 eV larger than bare Cu. This suggests a significant surface dipole, consistent with charge transfer predicted by theory. Our results indicate that CuN films are useful for controlling the electronic coupling between adsorbates and surface electron density on the nanometer scale.
©2007 American Institute of Physics
| History: | Received 31 October 2007; accepted 28 November 2007; published 18 December 2007 |
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KEYWORDS and PACS
copper,
copper compounds,
energy gap,
insulating thin films,
monolayers,
scanning tunnelling microscopy,
work function
- 73.30.+y
Surface double layers, Schottky barriers, and work functions - 71.20.Ps
Electronic structure of other crystalline inorganic compounds excluding metals, alloys, semiconductors and fullerenes - 68.37.Ef
Scanning tunneling microscopy of surfaces, interfaces and thin films including chemistry induced with STM - YEAR: 2007
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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