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Microwave dielectric loss at single photon energies and millikelvin temperatures

Appl. Phys. Lett. 92, 112903 (2008); doi:10.1063/1.2898887

Published 18 March 2008

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Aaron D. O'Connell, M. Ansmann, R. C. Bialczak, M. Hofheinz, N. Katz, Erik Lucero, C. McKenney, M. Neeley, H. Wang, E. M. Weig, A. N. Cleland, and J. M. Martinis
Department of Physics, University of California, Santa Barbara, California 93106, USA
The microwave performance of amorphous dielectric materials at very low temperatures and very low excitation strengths displays significant excess loss. Here, we present the loss tangents of some common amorphous and crystalline dielectrics, measured at low temperatures (T<100  mK) with near single-photon excitation energies, E/[h-bar]omega0~1, using both coplanar waveguide and lumped LC resonators. The loss can be understood using a two-level state defect model. A circuit analysis of the half-wavelength resonators we used is outlined, and the energy dissipation of such a resonator on a multilayered dielectric substrate is theoretically considered. ©2008 American Institute of Physics
History: Received 16 February 2008; accepted 27 February 2008; published 18 March 2008
Permalink: http://link.aip.org/link/?APPLAB/92/112903/1
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KEYWORDS and PACS

Keywords
PACS
  • 77.22.Gm
    Dielectric loss and relaxation
  • YEAR: 2008

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ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (14)

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  1. J. M. Martinis, K. B. Cooper, R. McDermott, M. Steffen, M. Ansmann, K. D. Osborn, K. Cicak, S. Oh, D. P. Pappas, R. W. Simmonds, and C. C. Yu, Phys. Rev. Lett. 95, 210503 (2005).
  2. A. Shnirman, G. Schon, I. Martin, and Y. Makhlin, Phys. Rev. Lett. 94, 127002 (2005).
  3. W. A. Phillips, J. Low Temp. Phys. 7, 351360 (1972).
  4. B. Golding, M. von Schickfus, S. Hunklinger, and K. Dransfeld, Phys. Rev. Lett. 43, 1817 (1979).
  5. S. Hunklinger and A. K. Raychaudhuri, Prog. Low Temp. Phys. 9, 265 (1986);
  6. Amorphous Solids: Low-Temperature Properties, edited by W. A. Phillips (Springer, Berlin, 1981).
  7. M. von Schickfus and S. Hunklinger, Phys. Lett. 64A, 144 (1977).
  8. Dielectric Materials and Applications, edited by A. R. von Hippel (MIT, Cambridge, MA, 1954).
  9. R. O. Pohl, X. Liu, and E. J. Thompson, Rev. Mod. Phys. 74, 991 (2002).
  10. B. A. Mazin, P. K. Day, H. G. LeDuc, A. Vayonakis, and J. Zmuidzinas, Proc. SPIE 4849, 283 (2002).
  11. D. M. Pozar, Microwave Engineering (Wiley, New York, 2005).
  12. X. Liu, B. E. White, Jr., R. O. Pohl, E. Iwanizcko, K. M. Jones, A. H. Mahan, B. N. Nelson, R. S. Crandall, and S. Veprek, Phys. Rev. Lett. 78, 4418 (1997).
  13. M. Neeley, M. Ansmann, R. C. Bialczak, M. Hofheinz, N. Katz, E. Lucero, A. O'Connell, H. Wang, A. N. Cleland, and J. M. Martinis, Nat. Phys. (to be published).
  14. D. C. Mattis and J. Bardeen, Phys. Rev. 111, 412 (1958).
  15. B. A. Mazin, M. E. Eckart, S. Golwala, B. Bumble, P. K. Day, J. Zmuidzinas, and F. A. Harrison, Appl. Phys. Lett. 89, 222507 (2006).

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