Near-field scanning optical microscopy with monolithic silicon light emitting diode on probe tip
Appl. Phys. Lett. 92, 131106 (2008); doi:10.1063/1.2904698
Published 31 March 2008
You are not logged in to this journal. Log in
We describe optical and topographic imaging using a light emitting diode monolithically integrated on a silicon probe tip for near-field scanning optical microscopy (NSOM). The light emission resulted from a silicon dioxide layer buried between a phosphorus-doped N+ silicon layer and a gallium-doped P+ silicon region locally created at the tip by a focused ion beam. The tip was employed in a standard NSOM excitation setup. The probe successfully measured optical as well as topographic images of a chromium test pattern with imaging resolutions of 400 and 50 nm, respectively. The directional resolution dependence of the acquired images directly corresponds to the shape, size, and polarity of the light source on the probe tip. To our knowledge, this report is the first successful near-field imaging result directly measured by such tip-embedded light sources.
©2008 American Institute of Physics
| History: | Received 13 September 2007; accepted 8 March 2008; published 31 March 2008 |
| Permalink: |
http://link.aip.org/link/?APPLAB/92/131106/1 |
KEYWORDS and PACS
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (22)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- B. Hecht, J. Chem. Phys. 112, 7761 (2000).
- S. R. Emory and S. Nie,
Proc. Natl. Acad. Sci. U.S.A. 93, 6264 (1996) . - P. F. Barbara, D. M. Adams, and D. B. O'Connor,
Annu. Rev. Mater. Sci. 29, 433 (1999) . - J. Teetsov and D. A. Vanden Bout,
J. Phys. Chem. B 104, 9378 (2000) . - M. F. Garcia-Parajo, J. A. Veerman, S. J. T. van Noort, B. G. de Grooth, J. Greve, and N. F. van Hulst,
Bioimaging 6, 43 (1998) . - G. Behme, A. Richter, M. Süptitz, and Ch. Lienau, Rev. Sci. Instrum. 68, 3458 (1997).
- M. Sasaki, K. Tanaka, and K. Hane,
Jpn. J. Appl. Phys., Part 1 39, 7150 (2000) . - P. N. Minh, T. Ono, and M. Esashi, Appl. Phys. Lett. 75, 4076 (1999).
- K. H. An, B. O'Connor, K. P. Pipe, Y. Zhao, and M. Shtein, Appl. Phys. Lett. 89, 111117 (2006).
- S. Heisig, O. Rudow, and E. Oesterschulze, Appl. Phys. Lett. 77, 1071 (2000).
- S. Khalfallah, C. Gorecki, J. Podlecki, M. Nishioka, H. Kawakatsu, and Y. Arakawa,
Appl. Phys. A: Mater. Sci. Process. A71, 223 (2000) . - A. J. Steckl, H. C. Mogul, and S. Mogren,
J. Vac. Sci. Technol. B 9, 2718 (1991) . - H. C. Mogul, A. J. Steckl, and E. Ganin,
IEEE Trans. Electron Devices 40, 1823 (1993) . - M. Vitzethum, R. Schmidt, P. Kiesel, P. Schafmeister, D. Reuter, A. D. Wieck, and G. H. Döler,
Physica E (Amsterdam) 13, 143 (2002) . - R. Schmidt, U. Scholz, M. Vitzethum, R. Fix, C. Metzner, P. Kailuweit, D. Reuter, A. Wieck, M. C. Hübner, and S. Stufler, Appl. Phys. Lett. 88, 121115 (2006).
- K. Karrai and R. D. Grober, Appl. Phys. Lett. 66, 1842 (1995).
- K. Hoshino, L. J. Rozanski, D. A. Vanden Bout, and X. J. Zhang,
J. Microelectromech. Syst. 17, 4 (2008) . - W. Boxleitner and G. Hobler,
Nucl. Instrum. Methods Phys. Res. B 180, 125 (2001) . - L. Heikkil, T. Kuusela, and H. P. Hedman, J. Appl. Phys. 89, 2179 (2001).
- T. Matsuda, M. Nishio, T. Ohzone, and H. Hori,
Solid-State Electron. 41, 887 (1997) . - K. Hoshino, K. Yamada, K. Matsumoto, and I. Shimoyama,
J. Micromech. Microeng. 16, 1285 (2006) . - L. Rebohle, T. Gebel, R. A. Yankov, T. Trautmann, W. Skorupa, J. Sun, G. Gauglitz, and R. Frank,
Opt. Mater. (Amsterdam, Neth.) 27, 1055 (2005) .







