Strain and composition mapping of epitaxial nanostructures
Appl. Phys. Lett. 92, 151914 (2008); doi:10.1063/1.2908214
Published 18 April 2008
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We have used surface x-ray diffraction and a direct method of phase reconstruction to obtain subangström resolution maps of an ion-beam milled In0.27Ga0.73As/GaAs(001) thin film exhibiting three-dimensional (3D) epitaxial nanostructures. The 3D electron density was calculated based on the diffraction pattern along the Bragg rods measured with synchrotron radiation, from which the chemical composition, strain profile, and average nanostructure shape were extracted. The film maintained a wetting layer exhibiting a sharp strain gradient, which extended into the substrate. Atop the wetting layer, the ion-beam milled islands possessed an apical shape and were depleted in indium.
©2008 American Institute of Physics
| History: | Received 22 February 2008; accepted 22 March 2008; published 18 April 2008 |
| Permalink: |
http://link.aip.org/link/?APPLAB/92/151914/1 |
KEYWORDS and PACS
chemical analysis,
electron density,
gallium arsenide,
III-V semiconductors,
indium compounds,
nanostructured materials,
semiconductor thin films,
surface reconstruction,
wetting,
X-ray diffraction
- 61.46.-w
Structure of nanoscale materials - 68.55.Nq
Thin film composition and phase identification - 68.35.Ct
Solid-solid interface structure and roughness - 72.80.Ey
Electrical conductivity of III-V and II-VI semiconductors - 72.20.-i
Electrical conductivity phenomena in semiconductors and insulators - 73.40.Kp
Electrical properties of III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions - YEAR: 2008
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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