Stoichiometric growth of high Curie temperature heavily alloyed GaMnAs
Appl. Phys. Lett. 92, 192502 (2008); doi:10.1063/1.2927481
Published 13 May 2008
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Heavily alloyed, 100 nm Ga1−xMnxAs (x>0.1) films are obtained via low-temperature molecular beam epitaxy by utilizing a combinatorial technique which allows systematic control of excess arsenic during growth. Reproducible electronic, magnetic, and structural properties are optimized in a narrow range of stoichiometric growth conditions. In contrast to a prediction of the Zener model of hole-mediated ferromagnetism, the Curie temperature of the stoichiometric material is independent of x (for x>0.1), while substitutional Mn content is proportional to x within a large window of growth conditions.
©2008 American Institute of Physics
| History: | Received 21 March 2008; accepted 15 April 2008; published 13 May 2008 |
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http://link.aip.org/link/?APPLAB/92/192502/1 |
KEYWORDS and PACS
Curie temperature,
ferromagnetic materials,
gallium arsenide,
gallium compounds,
magnetic semiconductors,
magnetic thin films,
manganese compounds,
molecular beam epitaxial growth,
semiconductor growth,
stoichiometry
- 75.70.-i
Magnetic properties of thin films, surfaces, and interfaces - 75.30.Kz
Magnetic phase boundaries - 68.55.ag
Semiconductor thin film nucleation and growth - 81.15.Hi
Molecular, atomic, ion, and chemical beam epitaxy - 75.50.Dd
Nonmetallic ferromagnetic materials - 75.50.Pp
Magnetic semiconductors - YEAR: 2008
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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