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Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

Appl. Phys. Lett. 92, 221114 (2008); doi:10.1063/1.2912503

Published 6 June 2008

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Hyon Chol Kang,1 Hanfei Yan,1 Robert P. Winarski,1 Martin V. Holt,1 Jörg Maser,1 Chian Liu,2 Ray Conley,2 Stefan Vogt,2 Albert T. Macrander,2 and G. Brian Stephenson3
1Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, USA
2X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
3Materials Science Division and Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, USA
We report improved results for hard x-ray focusing using a multilayer Laue lens (MLL). We have measured a line focus of 16  nm width with an efficiency of 31% at a wavelength lambda=0.064  nm (19.5  keV) using a partial MLL structure with an outermost zone width of 5  nm. The results are in good agreement with the theoretically predicted performance. ©2008 American Institute of Physics
History: Received 9 January 2008; accepted 1 April 2008; published 6 June 2008
Permalink: http://link.aip.org/link/?APPLAB/92/221114/1
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KEYWORDS and PACS

Keywords
PACS
  • 07.85.-m
    X- and γ-ray instruments
  • YEAR: 2008

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ISSN:
0003-6951 (print)   1077-3118 (online)
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