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Atomic structure of postgrowth annealed epitaxial Fe/(001)GaAs interfaces

Appl. Phys. Lett. 93, 121909 (2008); doi:10.1063/1.2990622

Published 24 September 2008

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James M. LeBeau, Qi O. Hu, Christopher J. Palmstrøm, and Susanne Stemmer
Materials Department, University of California, Santa Barbara, California 93106-5050, USA
The interfacial atomic structure of epitaxial Fe films grown by molecular beam epitaxy on c(4×4) reconstructed (001) GaAs was investigated using high-angle annular dark-field imaging in scanning transmission electron microscopy. No extended interfacial reaction phase is observed and the image contrast is discussed in terms of the interface atomic configuration. The images show an As-terminated semiconductor. The interface consists of a single partially occupied plane inserted between the Fe film and the GaAs, which most likely is occupied by Fe. This interface structure provides strong evidence for preferential Fe–As bonding across the interface. ©2008 American Institute of Physics
History: Received 6 July 2008; accepted 5 September 2008; published 24 September 2008
Permalink: http://link.aip.org/link/?APPLAB/93/121909/1
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KEYWORDS and PACS

Keywords
PACS
  • 68.35.Ct
    Solid-solid interface structure and roughness
  • 68.55.ag
    Semiconductor thin film nucleation and growth
  • 81.15.Hi
    Molecular, atomic, ion, and chemical beam epitaxy
  • 68.37.Hk
    Scanning electron microscopy (SEM) of surfaces, interfaces and thin films
  • 68.37.Lp
    Transmission electron microscopy (TEM) of surfaces, interfaces and thin films
  • 81.40.Gh
    Other heat and thermomechanical treatments
  • YEAR: 2008

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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AIP is a member of CrossRef AIP

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