Atomic structure of postgrowth annealed epitaxial Fe/(001)GaAs interfaces
Appl. Phys. Lett. 93, 121909 (2008); doi:10.1063/1.2990622
Published 24 September 2008
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The interfacial atomic structure of epitaxial Fe films grown by molecular beam epitaxy on c(4×4) reconstructed (001) GaAs was investigated using high-angle annular dark-field imaging in scanning transmission electron microscopy. No extended interfacial reaction phase is observed and the image contrast is discussed in terms of the interface atomic configuration. The images show an As-terminated semiconductor. The interface consists of a single partially occupied plane inserted between the Fe film and the GaAs, which most likely is occupied by Fe. This interface structure provides strong evidence for preferential Fe–As bonding across the interface.
©2008 American Institute of Physics
| History: | Received 6 July 2008; accepted 5 September 2008; published 24 September 2008 |
| Permalink: |
http://link.aip.org/link/?APPLAB/93/121909/1 |
KEYWORDS and PACS
annealing,
gallium arsenide,
III-V semiconductors,
interface structure,
iron,
molecular beam epitaxial growth,
scanning electron microscopy,
semiconductor epitaxial layers,
surface reconstruction,
transmission electron microscopy
- 68.35.Ct
Solid-solid interface structure and roughness - 68.55.ag
Semiconductor thin film nucleation and growth - 81.15.Hi
Molecular, atomic, ion, and chemical beam epitaxy - 68.37.Hk
Scanning electron microscopy (SEM) of surfaces, interfaces and thin films - 68.37.Lp
Transmission electron microscopy (TEM) of surfaces, interfaces and thin films - 81.40.Gh
Other heat and thermomechanical treatments - YEAR: 2008
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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