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Self-aligned flexible all-polymer transistor: Ultraviolet printing

Appl. Phys. Lett. 93, 203308 (2008); doi:10.1063/1.3028090

Published 20 November 2008

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Hyewon Kang, Tae-il Kim, and Hong H. Lee
School of Chemical and Biological Engineering, Seoul National University, Seoul 151-744, Republic of Korea
Flexible all-polymer transistor has received much attention because it is needed for the unique area of flexible circuits and displays, and the solution processing allowed with polymers would enable low-cost production. In this work, we introduce and utilize ultraviolet (UV) printing technique for the fabrication of flexible all-polymer transistor. The technique allows printing of submicron patterns of polymers without applying heat or pressure, requiring only UV light. The UV printing also allows self-aligned gate formation, which can be accomplished through a simple roll-to-roll printing. The electrical performance of the flexible transistor thus fabricated is better than that of the other flexible all-polymer transistors. ©2008 American Institute of Physics
History: Received 2 September 2008; accepted 23 October 2008; published 20 November 2008
Permalink: http://link.aip.org/link/?APPLAB/93/203308/1
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KEYWORDS and PACS

Keywords
PACS
  • 85.30.Tv
    Semiconductor field effect devices
  • 85.40.Hp
    Lithography, masks and pattern transfer (microelectronics)
  • 81.16.Nd
    Nanolithography in nanofabrication and processing
  • YEAR: 2008

PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (17)

  1. F. Garnier, R. Hajlaoui, A. Yassar, and P. Srivastava, Science 265, 1684 (1994). [Inspec] [ISI] [MEDLINE]
  2. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu, and E. P. Woo, Science 290, 2123 (2000). [MEDLINE]
  3. C. W. Sele, T. von Werne, R. H. Friend, and H. Sirringhaus, Adv. Mater. (Weinheim, Ger.) 17, 997 (2005). [ISI]
  4. J. Z. Wang, J. Gu, F. Zenhausern, and H. Sirringhaus, Appl. Phys. Lett. 88, 133502 (2006).
  5. J. Z. Wang, Z. H. Zheng, H. W. Li, W. T. S. Huck, and H. Sirringhaus, Nature Mater. 3, 171 (2004). [MEDLINE]
  6. M. Halik, H. Klauk, U. Zschieschang, T. Kriem, G. Schmid, W. Radlik, and K. Wussow, Appl. Phys. Lett. 81, 289 (2002).
  7. T. G. Bäcklund, H. G. O. Sandberg, R. Österbacka, H. Stubb, T. Mäkelä, and S. Jussila, Synth. Met. 148, 87 (2005). [Inspec]
  8. M. S. Lee, H. S. Kang, J. Joo, A. J. Epsteing, and J. Y. Lee, Thin Solid Films 477, 169 (2005).
  9. T. Mäkelä, S. Jussila, H. Kosonen, T. G. Bäcklund, H. G. O. Sandberg, and H. Stubb, Synth. Met. 153, 285 (2005). [Inspec]
  10. N. Stutzmann, R. H. Friend, and H. Sirringhaus, Science 299, 1881 (2003). [MEDLINE]
  11. S. P. Li, C. J. Newsome, T. Kugler, M. Ishida, and S. Inoue, Appl. Phys. Lett. 90, 172103 (2007).
  12. Y. -Y. Noh, N. Zhao, M. Caironi, and H. Sirringhaus, Nat. Nanotechnol. 2, 784 (2007). [MEDLINE]
  13. S.-J. Choi, P. J. Yoo, S. J. Baek, T. W. Kim, and H. H. Lee, J. Am. Chem. Soc. 126, 7744 (2004). [MEDLINE]
  14. J. Park, S. Y. Park, S.-O. Shim, H. Kang, and H. H. Lee, Appl. Phys. Lett. 85, 3283 (2004).
  15. J. Rhee and H. H. Lee, Appl. Phys. Lett. 81, 4165 (2002). [ISI]
  16. D. Suh, S.-J. Choi, and H. H. Lee, Adv. Mater. (Weinheim, Ger.) 17, 1554 (2005). [ISI]
  17. M. A. Meitl, Z.-T. Zhu, V. Kumar, K. J. Lee, X. Feng, Y. Y. Huang, I. Adesida, R. G. Nuzzo, and J. A. Rogers, Nature Mater. 5, 33 (2006).