Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography
Appl. Phys. Lett. 94, 011101 (2009); doi:10.1063/1.3036955
Published 5 January 2009
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We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.
©2009 American Institute of Physics
| History: | Received 26 August 2008; accepted 5 November 2008; published 5 January 2009 |
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http://link.aip.org/link/?APPLAB/94/011101/1 |
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0003-6951 (print)
1077-3118 (online)
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