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A subwavelength near-infrared negative index material

Appl. Phys. Lett. 94, 131107 (2009); doi:10.1063/1.3110957

Published 2 April 2009

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Xuhuai Zhang,1 Marcelo Davanço,1 Yaroslav Urzhumov,2 Gennady Shvets,2 and Stephen R. Forrest1,3
1Department of Physics, University of Michigan, Ann Arbor, Michigan 48109-1040, USA
2Department of Physics, University of Texas, Austin, Texas 78712-0264, USA
3Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122, USA
A single layer of a subwavelength negative index material (NIM) operating at a wavelength of 1  µm is demonstrated. The geometrical parameters of the nanostructure are determined by characterizing its optical transmission spectrum. We show through photonic band calculations that these parameters give rise to a negative index in a corresponding bulk NIM. The fabrication inaccuracies in the dielectric spacer thickness that are likely to be introduced in a prism composed of multiple layers of this structure are shown through full-wave simulations to be within a range that preserves its negative refractive behavior. ©2009 American Institute of Physics
History: Received 7 December 2008; accepted 6 March 2009; published 2 April 2009
Permalink: http://link.aip.org/link/?APPLAB/94/131107/1
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0003-6951 (print)   1077-3118 (online)
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REFERENCES (11)
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