Piezoresistive transduction in multilayer polycrystalline silicon resonators
Appl. Phys. Lett. 95, 133113 (2009); doi:10.1063/1.3241077
Published 1 October 2009
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We demonstrate piezoresistive transduction of mechanical motion from out-of-plane flexural micromechanical resonators made from stacked thin films. The resonators are fabricated from two highly doped polycrystalline silicon layers separated by an interlayer dielectric. We examine two interlayer materials: thermal silicon dioxide and stoichiometric silicon nitride. We show that via one-time dielectric breakdown, the film stack functions as a vertical piezoresistor effectively transducing the motion of the resonators. We obtain a gauge factor of ~5, which is sufficient to detect the resonator motion. The simple film stack constitutes a vertically oriented piezoresistor that is readily integrated with micro- and nanoscale resonators.
©2009 American Institute of Physics
| History: | Received 11 June 2009; accepted 9 September 2009; published 1 October 2009 |
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http://link.aip.org/link/?APPLAB/95/133113/1 |
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0003-6951 (print)
1077-3118 (online)
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