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Effect of uniaxial-strain on Ge p-i-n photodiodes integrated on Si

Appl. Phys. Lett. 95, 161106 (2009); doi:10.1063/1.3254181

Published 22 October 2009

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Hyun-Yong Yu, Donghyun Kim, Shen Ren, Masaharu Kobayashi, David A. B. Miller, Yoshio Nishi, and Krishna C. Saraswat
Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA
We demonstrate the effect of uniaxial tensile and compressive strain in Ge p-i-n photodiode integrated on Si using four-point bending structures. Responsivity at 1550 nm is increased from 0.67 to 0.75 A/W by tensile strain in the <110> direction while for compressive strain it decreases from 0.67 to 0.477 A/W. These uniaxial tensile and compressive strains also effectively result in shifts of the absorption spectra toward longer and shorter wavelength as they reduce or increase the direct bandgap energy of the Ge layer, respectively. ©2009 American Institute of Physics
History: Received 26 June 2009; accepted 2 October 2009; published 22 October 2009
Permalink: http://link.aip.org/link/?APPLAB/95/161106/1
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KEYWORDS and PACS

Keywords
PACS
  • 85.60.Dw
    Photodiodes; phototransistors; photoresistors
  • 85.30.De
    Semiconductor-device characterization, design, and modeling
  • YEAR: 2009

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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