Effect of uniaxial-strain on Ge p-i-n photodiodes integrated on Si
Appl. Phys. Lett. 95, 161106 (2009); doi:10.1063/1.3254181
Published 22 October 2009
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We demonstrate the effect of uniaxial tensile and compressive strain in Ge p-i-n photodiode integrated on Si using four-point bending structures. Responsivity at 1550 nm is increased from 0.67 to 0.75 A/W by tensile strain in the
110
direction while for compressive strain it decreases from 0.67 to 0.477 A/W. These uniaxial tensile and compressive strains also effectively result in shifts of the absorption spectra toward longer and shorter wavelength as they reduce or increase the direct bandgap energy of the Ge layer, respectively.
©2009 American Institute of Physics
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direction while for compressive strain it decreases from 0.67 to 0.477 A/W. These uniaxial tensile and compressive strains also effectively result in shifts of the absorption spectra toward longer and shorter wavelength as they reduce or increase the direct bandgap energy of the Ge layer, respectively.
©2009 American Institute of Physics
| History: | Received 26 June 2009; accepted 2 October 2009; published 22 October 2009 |
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http://link.aip.org/link/?APPLAB/95/161106/1 |
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