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A scattering model for surface-textured thin films

Appl. Phys. Lett. 95, 171108 (2009); doi:10.1063/1.3254239

Published 29 October 2009

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Klaus Jäger and Miro Zeman
Photovoltaic Materials and Devices Laboratory / DIMES, Delft University of Technology, P. O. Box 5031, 2600 GA Delft, The Netherlands
We present a mathematical model that relates the surface morphology of randomly surface-textured thin films with the intensity distribution of scattered light. The model is based on the first order Born approximation [see e.g., M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge University Press, Cambridge, England, 1999)] and on Fraunhofer scattering. Scattering data of four transparent conductive oxide films with different surface textures were used to validate the model and good agreement between the experimental and calculated intensity distribution was obtained. ©2009 American Institute of Physics
History: Received 3 September 2009; accepted 2 October 2009; published 29 October 2009
Permalink: http://link.aip.org/link/?APPLAB/95/171108/1
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KEYWORDS and PACS

Keywords
PACS
  • 78.66.Hf
    Optical properties of II-VI semiconductors (thin films)
  • 68.35.bg
    Surface structure of semiconductors
  • 68.55.J-
    Thin film morphology
  • YEAR: 2009

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PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (12)
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