Applied Physics Letters
Search:
   
 
 
 
Previous Article
Nematic anchoring on carbon nanotubes
A dilute suspension of carbon nanotubes (CNTs) in a nematic liquid crystal (LC) does not disturb the LC director. Due to a strong LC-CNT anchoring energy and structural symmetry matching, CNT long axi...
Next Article
Growth of high-density vertically aligned arrays of carbon nanotubes by plasma-assisted catalyst pretreatment
A plasma-assisted thermal pretreatment of catalyst films (Ni, Co, or Fe) greatly facilitates the direct growth of high-density vertically aligned arrays of small diameter carbon nanotubes (CNTs) on co...

Determining surface Fermi level pinning position of InN nanowires using electrolyte gating

Appl. Phys. Lett. 95, 173114 (2009); doi:10.1063/1.3255010

Published 30 October 2009

You are not logged in to this journal. Log in

D. R. Khanal,1,2 W. Walukiewicz,2 J. Grandal,3 E. Calleja,3 and J. Wu1,2
1Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA
2Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
3Department of Ingeniería Electrónica-ISOM, Universidad Politécnica, Ciudad Universitaria, Madrid, Spain

We demonstrate quantitative determination of surface Fermi level pinning position in InN nanowires using polymer electrolyte gating and three-dimensional (3D) electrostatic modeling of charge distribution. We find pinning of the Fermi level 0.6–0.7 eV above the conduction band minimum at the surface of the nanowires. After taking into account the Fermi level pinning, doping concentration and carrier mobilities are also evaluated and compared with InN thin films. This general approach of combining electrolyte gating experiments with 3D numerical modeling can be applied to nanowires of other materials to determine their surface Fermi level pinning position. ©2009 American Institute of Physics
History: Received 29 July 2009; accepted 6 October 2009; published 30 October 2009
Permalink: http://link.aip.org/link/?APPLAB/95/173114/1
BUY THIS ARTICLE   (US$24)
Download HTML Download Sectioned HTML Download PDF (264 kB) View Cart

KEYWORDS and PACS

Keywords
PACS
  • 71.20.Nr
    Electronic structure of crystalline semiconductor compounds
  • 73.50.Dn
    Low-field transport and mobility; piezoresistance (thin films)
  • 61.72.uj
    Doping and impurity implantation in III-V and II-VI semiconductors
  • 73.20.At
    Surface states, band structure, electron density of states
  • 73.61.Ey
    Electrical properties of III-V semiconductors (thin films)
  • YEAR: 2009

RELATED DATABASES


To view database links for this article,
you need to log in.
To view database links for this article,
you need to log in.

PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (21)

For access to fully linked references, you need to log in. For access to fully linked references, you need to Log in.
  1. R. Calarco, M. Marso, T. Richter, A. I. Aykanat, R. Meijers, A. d. Hart, T. Stoica, and H. Lüth, Nano Lett. 5, 981 (2005).
  2. F. Werner, F. Limbach, M. Carsten, C. Denker, J. Malindretos, and A. Rizzi, Nano Lett. 9, 1567 (2009).
  3. E. Calleja, J. Grandal, M. A. Sánchez-García, M. Niebelschutz, V. Cimalla, and O. Ambacher, Appl. Phys. Lett. 90, 262110 (2007).
  4. J. Wu, J. Appl. Phys. 106, 011101 (2009).
  5. E. C. Garnett, Y. Tseng, D. R. Khanal, J. Wu, J. Bokor, and P. Yang, Nat. Nanotechnol. 4, 311 (2009).
  6. D. R. Khanal and J. Wu, Nano Lett. 7, 2778 (2007).
  7. O. Wunnicke, Appl. Phys. Lett. 89, 083102 (2006).
  8. I. Mahboob, T. D. Veal, C. F. McConville, H. Lu, and W. J. Schaff, Phys. Rev. Lett. 92, 036804 (2004).
  9. P. D. C. King, T. D. Veal, C. F. McConville, F. Fuchs, J. Furthmuller, F. Bechstedt, P. Schley, R. Goldhahn, J. Schoermann, D. J. As, K. Lischka, D. Muto, H. Naoi, Y. Nanishi, H. Lu, and W. J. Schaff, Appl. Phys. Lett. 91, 092101 (2007).
  10. G. F. Brown, J. W. Ager, W. Walukiewicz, W. J. Schaff, and J. Wu, Appl. Phys. Lett. 93, 262105 (2008).
  11. J. W. L Yim, R. E. Jones, K. M. Yu, J. W. Ager, W. Walukiewicz, W. J. Schaff, and J. Wu, Phys. Rev. B 76, 041303(R) (2007).
  12. J. Grandal, M. A. Sanchez-Garcia, F. Calle, and E. Calleja, Phys. Status Solidi C 2, 2289 (2005).
  13. C. Y. Chang, G. C. Chi, W. M. Wang, L. C. Chen, K. H. Chen, F. Ren, and S. J. Pearton, Appl. Phys. Lett. 87, 093112 (2005).
  14. Z. Cai, S. Garzon, M. V. S. Chandrashekhar, R. A. Webb, and G. Koley, J. Electron. Mater. 37, 585 (2008).
  15. S. A. Dayeh, D. P. R. Aplin, X. Zhou, P. K. L. Yu, E. T. Yu, and D. Wang, Small 3, 326 (2007).
  16. K. Ueno, S. Nakamura, H. Shimotani, A. Ohtomo, N. Kimura, T. Nojima, H. Aoki, Y. Iwasa, and M. Kawasaki, Nature Mater. 7, 855 (2008).
  17. M. J. Panzer and C. D. Frisbie, J. Am. Chem. Soc. 129, 6599 (2007).
  18. R. E. Jones, K. M. Yu, S. X. Li, W. Walukiewicz, J. W. Ager, E. E. Haller, H. Lu, and W. J. Schaff, Phys. Rev. Lett. 96, 125505 (2006).
  19. D. Segev and C. G. van de Walle, Europhys. Lett. 76, 305 (2006).
  20. R. E. Jones, S. X. Li, L. Hsu, K. M. Yu, W. Walukiewicz, Z. Lillental-Weber, J. W. Ager, E. E. Haller, H. Lu, and W. J. Schaff, Physica B376, 436 (2006).
  21. W. J. Schaff, X. Chen, D. Hao, K. Matthews, T. Richards, L. F. Eastman, H. Lu, C. J. Cho, and H. Y. Cha, Phys. Status Solidi B 245, 868 (2008).

CITING ARTICLES

For access to citing articles, you need to log in.
For access to citing articles, you need to Log in.