Measurement of effective electron mass in biaxial tensile strained silicon on insulator
Appl. Phys. Lett. 95, 182101 (2009); doi:10.1063/1.3254330
Published 2 November 2009
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We present measurements of the effective electron mass in biaxial tensile strained silicon on insulator (SSOI) material with 1.2 GPa stress and in unstrained SOI. Hall-bar metal oxide semiconductor field effect transistors on 60 nm SSOI and SOI were fabricated and Shubnikov–de Haas oscillations in the temperature range of T=0.4–4 K for magnetic fields of B=0–10 T were measured. The effective electron mass in SSOI and SOI samples was determined as mt=(0.20±0.01)m0. This result is in excellent agreement with first-principles calculations of the effective electron mass in the presence of strain.
©2009 American Institute of Physics
| History: | Received 16 July 2009; accepted 6 October 2009; published 2 November 2009 |
| Permalink: |
http://link.aip.org/link/?APPLAB/95/182101/1 |
KEYWORDS and PACS
- 73.40.Qv
Electrical properties of metal-insulator-semiconductor structures - 71.18.+y
Fermi surface: calculations and measurements; effective mass, -g factor - 85.30.Tv
Semiconductor field effect devices - 72.20.My
Galvanomagnetic and other magnetotransport effects (semiconductors/insulators) - 71.15.Mb
Density functional theory, local density approximation, gradient and other corrections (condensed matter electronic structure) - YEAR: 2009
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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