Low-temperature magnetotransport behaviors of heavily Mn-doped (Ga,Mn)As films with high ferromagnetic transition temperature
Appl. Phys. Lett. 95, 182505 (2009); doi:10.1063/1.3259821
Published 5 November 2009
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We report the low-temperature magnetotransport behaviors of (Ga,Mn)As films with the nominal Mn concentration x larger than 10%. The ferromagnetic transition temperature TC can be enhanced to 191 K after postgrowth annealing (Ga,Mn)As with x=20%. The temperature Tm, corresponding to the resistivity minimum in the curve of resistivity versus temperature at temperature below TC, depends on Mn concentration, annealing condition, and magnetic field. Moreover, we find that the variable-range hopping may be the main conductive mechanism when temperature is lower than Tm.
©2009 American Institute of Physics
| History: | Received 10 August 2009; accepted 14 October 2009; published 5 November 2009 |
| Permalink: |
http://link.aip.org/link/?APPLAB/95/182505/1 |
KEYWORDS and PACS
annealing,
Curie temperature,
doping profiles,
electrical resistivity,
ferromagnetic materials,
gallium arsenide,
gallium compounds,
galvanomagnetic effects,
hopping conduction,
III-V semiconductors,
manganese compounds,
semiconductor doping,
semiconductor thin films,
semimagnetic semiconductors
- 72.20.My
Galvanomagnetic and other magnetotransport effects (semiconductors/insulators) - 75.50.Dd
Nonmetallic ferromagnetic materials - 73.61.Ey
Electrical properties of III-V semiconductors (thin films) - 75.50.Pp
Magnetic semiconductors - 61.72.U-
Doping and impurity implantation in crystals - 75.30.Kz
Magnetic phase boundaries - YEAR: 2010
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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