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Improved red-response in thin film a-Si:H solar cells with soft-imprinted plasmonic back reflectors

Appl. Phys. Lett. 95, 183503 (2009); doi:10.1063/1.3256187

Published 3 November 2009

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Vivian E. Ferry,1 Marc A. Verschuuren,2 Hongbo B. T. Li,3 Ruud E. I. Schropp,3 Harry A. Atwater,1 and Albert Polman4
1Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, Pasadena, California 91125, USA
2Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands
3Utrecht University, Debye Institute for Nanomaterials Science, Section Nanophotonics, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
4Center for Nanophotonics, FOM—Institute AMOLF, Science Park 104, 1098XG Amsterdam, The Netherlands
The impact of controlled nanopatterning on the Ag back contact of an n-i-p a-Si:H solar cell was investigated experimentally and through electromagnetic simulation. Compared to a similar reference cell with a flat back contact, we demonstrate an efficiency increase from 4.5% to 6.2%, with a 26% increase in short circuit current density. Spectral response measurements show the majority of the improvement between 600 and 800 nm, with no reduction in photocurrent at wavelengths shorter than 600 nm. Optimization of the pattern aspect ratio using electromagnetic simulation predicts absorption enhancements over 50% at 660 nm. ©2009 American Institute of Physics
History: Received 4 September 2009; accepted 6 October 2009; published 3 November 2009
Permalink: http://link.aip.org/link/?APPLAB/95/183503/1
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KEYWORDS and PACS

Keywords
PACS
  • 81.16.Rf
    Nanoscale pattern formation in nanofabrication and processing
  • 73.50.Pz
    Photoconduction and photovoltaic effects in thin films
  • YEAR: 2009

PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
Publisher:
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REFERENCES (20)
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