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Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition

Appl. Phys. Lett. 95, 201906 (2009); doi:10.1063/1.3267101

Published 20 November 2009

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C. Bayram, N. Péré-laperne, and M. Razeghi
Department of Electrical Engineering and Computer Science, Center for Quantum Devices, Northwestern University, Evanston, Illinois 60208, USA
AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (TS) (from 900 to 1035 °C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same TS) or grown at lower TS (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15  µm are demonstrated via controlling well width and growth temperature. ©2009 American Institute of Physics
History: Received 1 September 2009; accepted 3 November 2009; published 20 November 2009
Permalink: http://link.aip.org/link/?APPLAB/95/201906/1
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KEYWORDS and PACS

Keywords
PACS
  • 68.65.Cd
    Superlattices (structure and nonelectronic properties)
  • 81.15.Gh
    Chemical vapor deposition
  • 78.55.Cr
    Photoluminescence in III-V semiconductors
  • 81.05.Ea
    III-V semiconductors: fabrication, treatment, testing and analysis
  • 78.67.Pt
    Optical properties of multilayers and superlattices
  • YEAR: 2010

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ISSN:
0003-6951 (print)   1077-3118 (online)
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