Observation of space-charge-limited current due to charge generation at interface of molybdenum dioxide and organic layer
Appl. Phys. Lett. 95, 203306 (2009); doi:10.1063/1.3267082
Published 20 November 2009
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Current density-voltage characteristics of hole-only devices are influenced by thicknesses of molybdenum dioxide (MoO2) and molybdenum trioxide (MoO3) as buffer layers. A space-charge-limited current of N,N
-diphenyl-N,N
-bis(1-naphthyl)-1,1
-biphenyl-4,4
-diamine (
-NPD) is observed in a wide range of MoO2 thicknesses from 0.25 to 10 nm and at a specific MoO3 thickness of 0.75 nm. Charge transfer characteristics at interfaces of MoO2/
-NPD and MoO3/
-NPD are investigated from changes in fluorescence intensity of
-NPD. Reasons of the improved device characteristics are discussed in terms of interfacial charge generation composed of charged transfer and charge separation.
©2009 American Institute of Physics
-diphenyl-N,N
-bis(1-naphthyl)-1,1
-biphenyl-4,4
-diamine (
-NPD) is observed in a wide range of MoO2 thicknesses from 0.25 to 10 nm and at a specific MoO3 thickness of 0.75 nm. Charge transfer characteristics at interfaces of MoO2/
-NPD and MoO3/
-NPD are investigated from changes in fluorescence intensity of
-NPD. Reasons of the improved device characteristics are discussed in terms of interfacial charge generation composed of charged transfer and charge separation.
©2009 American Institute of Physics
| History: | Received 1 September 2009; accepted 2 November 2009; published 20 November 2009 |
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http://link.aip.org/link/?APPLAB/95/203306/1 |
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0003-6951 (print)
1077-3118 (online)
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