Synthesis of Microscale Lead Sulfide Disks by Patterned Self-Assembled Monolayer
pp. 3-8
216th ECS Meeting
Volume 25, Issue 4 October 4 - October 9, 2009 , Vienna, Austria
Atomic Layer Deposition Applications 5 Editor(s): S. De Gendt, S. Bent, A. Delabie, J. Elam, S. Kang, O. Van der Straten, A. Londergan
Volume 25, Issue 4 October 4 - October 9, 2009 , Vienna, Austria
Atomic Layer Deposition Applications 5 Editor(s): S. De Gendt, S. Bent, A. Delabie, J. Elam, S. Kang, O. Van der Straten, A. Londergan
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This work explores an approach to utilize nanosphere lithography (NSL) and atomic layer deposition (ALD) to fabricate an array of microscale disks of lead sulfide (PbS). In this approach, a mold to fabricate polymer stamps was produced by NSL. Using these stamps a patterned self-assembled monolayer (SAM) of octadecyltrichlorosilane (ODTS) was deposited using microcontact printing. The ODTS SAM functioned as a resist to block the growth of ALD PbS. The resulting PbS disks were characterized by scanning electron microscopy (SEM) and Auger electron spectroscopy (AES) to confirm the morphology and stoichiometry. Regular arrays of microscale PbS disks were successfully fabricated. This is a potentially attractive methodology for fabrication of multi-layer devices.
©2009 COPYRIGHT ECS - The Electrochemical Society
©2009 COPYRIGHT ECS - The Electrochemical Society
| Permalink: | http://dx.doi.org/10.1149/1.3205037 |
EDITORIALLY RELATED
- Synthesis of Microscale Lead Sulfide Disks by Patterned Self-Assembled Monolayer
Takane Usui et al.
Meet. Abstr. - Electrochem. Soc. 902, 2010 (2009)
PUBLICATION INFORMATION
1938-5862 (print)
1938-6737 (online)
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