Propagation of an unneutralized intense relativistic electron beam in a magnetic field
In this paper the results of a series of electron-beam vacuum propagation experiments are presented and compared with theoretical predictions. Important conclusions pertaining to time-dependent diode ...
In this paper the results of a series of electron-beam vacuum propagation experiments are presented and compared with theoretical predictions. Important conclusions pertaining to time-dependent diode ...
Steady-state self-focusing and filamentation of whistlers in a plasma
Using the earlier expressions for the nonlinear dielectric tensor of a magnetoplasma, the authors have analyzed the steady-state self-focusing and filamentation of high-power whistlers. On the short t...
Using the earlier expressions for the nonlinear dielectric tensor of a magnetoplasma, the authors have analyzed the steady-state self-focusing and filamentation of high-power whistlers. On the short t...
Magnetic cutoff in high-current diodes
J. Appl. Phys. 48, 1070 (1977); doi:10.1063/1.323782
Issue Date: March 1977
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The process of magnetic cutoff in diodes is investigated for several geometrical configurations. Generalized coordinates are used to show that the cutoff mechanism has certain basic properties which are common to all of the configurations considered. Theoretical solutions for two different one-dimensional flow patterns are compared and shown to have similar mathematical properties. Measurements are compared to theory for several types of magnetic cutoff.
Journal of Applied Physics is copyrighted by The American Institute of Physics.
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BibSonomy
PACS
- 41.80.Dd
Electricity and magnetism: fields and charged particles Particle beams and particle optics Electron beams and electron optics - 52.80.Vp
The physics of plasmas and electric discharges Electric discharges Discharge in vacuum - 84.70.+p
Electromagnetic technology* High-current and high-voltage technology - 52.75.-d
The physics of plasmas and electric discharges Plasma devices and applications - YEAR: 1977
RELATED DATABASES
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0021-8979 (print)
1089-7550 (online)
AIP
REFERENCES (21)
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- H. H. Fleischmann, Phys. Today 28 (No. 5), 35 (1975).
- R. K. Parker, R. E. Anderson, and C. V. Duncan, J. Appl. Phys. 45, 2463 (1974).
- B. Bernstein and I. Smith, IEEE Trans. Nucl. Sci. NS-20, 294 (1973).
- A. W. Hull,
Phys. Rev. 18, 31 (1921) . - L. Brillouin, Phys. Rev. 67, 260 (1945).
- R. N. Sudan and R. V. Lovelace, Phys. Rev. Lett. 31, 1174 (1973).
- A. T. Forrester, J. Appl. Phys. 46, 2051 (1975).
- A. Ron, A. A. Mondelli, and N. Rostoker,
IEEE Trans. Plasma Sci. PS-1, 85 (1973) . - R. V. Lovelace and E. Ott, Phys. Fluids 17, 1263 (1974).
- V. S. Voronin and A. N. Lebedev, Sov. Phys.-Tech. Phys. 18, 1627 (1974).
- J. M. Creedon, J. Appl. Phys. 46, 2946 (1975).
- V. S. Voronin and A. N. Lebedev (Ref. 10) use a planar approximation for a cylindrical configuration.
- H. Lass, Vector and Tensor Analysis (McGraw-Hill, New York, 1950), p. 50.
- J. D. Jackson, Classical Electrodynamics (Wiley, New York, 1963).
- J. Creedon, Physics International Co. Report No. PIIR-4-76, 1976 (unpublished).
- F. Friedlander, R. Hechtel, H. Jory, and C. Mosher, Varian Associates Report No. DASA 2173, 1968 (unpublished).
- J. Golden, T. J. Orzechowski, and G. Bekefi, J. Appl. Phys. 45, 3211 (1974).
- T. J. Orzechowski and G. Bekefi, Phys. Fluids 19, 43 (1976).
- R. L. Jepsen, Crossed Field Microwave Devices, edited by E. Okress (Academic, New York, 1961), p. 251.
- K. Mouthaan and C. Susskind, J. Appl. Phys. 37, 2598 (1966).
- M. Di Capua, J. Creedon, and R. Huff, J. Appl. Phys. 47, 1887 (1976).
