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Static compression of silicon in the [100] and in the [111] directions

J. Appl. Phys. 51, 1072 (1980); doi:10.1063/1.327714

Issue Date: February 1980

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Mool C. Gupta and Arthur L. Ruoff
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
High pressures were generated using a diamond indentor technique. The phase transition in silicon loaded in the [100] direction and silicon loaded in the [111] direction under high pressure was studied. From the behavior of electrical resistance of silicon loaded in the [100] direction, it was found that it becomes metallic at about 12.0 GPa in agreement with the previously reported results on silicon using different techniques. However, silicon loaded in the [111] direction becomes metallic at a lower pressure. The silicon transition is highly sensitive to the type of stress applied. Journal of Applied Physics is copyrighted by The American Institute of Physics.
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KEYWORDS and PACS

Keywords
PACS
  • 72.80.Cw
    Electronic transport in condensed matter Conductivity of specific semiconductors and insulators Elemental semiconductors
  • 61.50.Jr
    Structure of liquids and solids; crystallography Crystalline state (including molecular motions in solids) Crystal morphology and orientation
  • YEAR: 1980

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
Publisher:
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