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The study of mechanical properties of a-C:H films by Brillouin scattering and ultralow load indentation

J. Appl. Phys. 66, 4729 (1989); doi:10.1063/1.343833

Issue Date: 15 November 1989

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X. Jiang, J. W. Zou, K. Reichelt, and P. Grünberg
Institut für Festkörperforschung der KFA Jülich, Federal Republic of Germany
In this study diamondlike a-C:H films have been prepared by different methods: In our first experiment a-C:H films were deposited by plasma decomposition of methane at different bias voltages. In the second experiment a-C:H films with high hardness were implanted with 400-keV C+ ions and different doses between 1013 and 1017 ions/cm2 . Subsequently, the following mechanical properties of the films were measured: The shear modulus µ by the frequency of the surface phonon (Rayleigh wave), the stiffness S by an ultralow load indentation of diamond. The Young's modulus and the Poisson's ratio were calculated from µ and S. The internal stress sigma was determined with the bending beam method. From the Young's modulus E and the internal stress sigma, the average strain epsilon of the films has been calculated. From the behavior of epsilon it was concluded that a phase transition from amorphous diamondlike to amorphous graphitelike a-C:H films occurred with increasing substrate bias voltage. Journal of Applied Physics is copyrighted by The American Institute of Physics.
History: Received 20 February 1989; accepted 19 July 1989
Permalink: http://link.aip.org/link/?JAPIAU/66/4729/1
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KEYWORDS and PACS

Keywords
PACS
  • 62.20.Dc
    Mechanical, acoustical, and rheological properties of condensed matter Mechanics and rheology of solids Elasticity, elastic constants; vibration
  • 62.20.Fe
    Mechanical, acoustical, and rheological properties of condensed matter Mechanics and rheology of solids Deformation and plasticity (including yield, ductility, and superplasticity)
  • 61.70.Vn
    Structure of liquids and solids; crystallography Defects in crystals Doping and impurity implantation in other materials
  • 52.80.-s
    The physics of plasmas and electric discharges Electric discharges
  • YEAR: 1988-89

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
Publisher:
AIP is a member of CrossRef AIP

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