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Effects of platinum content and substrate bias on the structure and magnetic properties of CoCrPt/Cr thin films

J. Appl. Phys. 73, 5563 (1993); doi:10.1063/1.353651

Issue Date: 15 May 1993

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Pawel Glijer and John M. Sivertsen
Department of Chemical Engineering and Materials Science, The Center for Micromagnetics and Information Technologies, University of Minnesota, Minneapolis, Minnesota 55455

Jack H. Judy
Department of Electrical Engineering, The Center for Micromagnetics and Information Technologies, University of Minnesota, Minneapolis, Minnesota 55455
The effects of the Pt content (0–40 at. %) and the developed dc substrate bias voltage (0 to −190 V) on the magnetic properties and structure of rf sputtered CoCrPt/Cr films with two different remanent magnetization-thickness products Mrdelta (0.7 and 2.3 memu/cm2) were studied. It was demonstrated that a wide range of in-plane coercivities (500–3450 Oe) can be easily obtained in these films. The addition of Pt affected the magnetic properties of the films through changes of the lattice parameter, texture, and phase composition. A maximum in the in-plane coercivity exists for moderate amounts of Pt. The saturation magnetization decreased monotonically with increasing Pt content. rf substrate bias increased the in-plane coercivity and altered the character of the magnetic interactions through changes of the stress, texture and microstructure of the magnetic layer. Journal of Applied Physics is copyrighted by The American Institute of Physics.
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KEYWORDS and PACS

Keywords
PACS
  • 75.70.Fr
    Magnetic properties and materials Magnetic films and multilayers Magnetic ordering in multilayers
  • 75.50.Rr
    Magnetic properties and materials Studies of specific magnetic materials Magnetism in interface structures (including layer and superlattice structures)
  • 68.65.+g
    Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Layer structures: multilayers, and superlattices (growth, structure, and nonelectronic properties)
  • 81.15.Cd
    Materials science Methods of deposition of films and coatings Deposition by sputtering
  • YEAR: 1993

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (10)

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