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Electrodeposition of patterned magnetic nanostructures

J. Appl. Phys. 84, 6359 (1998); doi:10.1063/1.368963

Issue Date: 1 December 1998

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J. L. Duvail, S. Dubois, and L. Piraux
Unité de Physico-Chimie et de Physique des Matériaux, Université Catholique de Louvain, 1 Place Croix du Sud, B-1348 Louvain-la-Neuve, Belgium

A. Vaurès and A. Fert
Unité Mixte de Recherche CNRS–Thomson CSF, Laboratoire Central de Recherche Thomson, 91404 Orsay, France
Université Paris-Sud, F-91405 Orsay, France

D. Adam and M. Champagne
Groupe de Physique, Laboratoire Central de Recherche Thomson, 91404 Orsay, France

F. Rousseaux and D. Decanini
Laboratoire de Microstructures et Microélectronique, L2M/CNRS, 196 avenue H. Ravera, 92225 Bagneux, France
We report on fabrication and characterization of two types of devices, both with submicronic dimensions, and fabricated by combining lithography and electrodeposition. The first device, obtained by combining electron-beam lithography and electrodeposition, was devised to measure the current perpendicular to the plane giant magnetoresistance (CPP-GMR) of a single permalloy/copper multilayered nanopillar (height ~ 0.3 µm, diameter ~ 0.1 µm). Besides the fundamental interest of the spin-dependent transport properties in such nanoscaled magnets, this system is a potential candidate as a CPP-GMR sensor used, for example, to read very high-density magnetic storage. The second device, relevant for high-density storage media, consists in large areas (4 × 4 mm2) of magnetic permalloy dots (diameter ~ 0.26 µm, period ~ 0.4 µm) electrodeposited in a x-ray patterned photoresist matrix. We study the magnetic behavior of such mesoscopic pillars as a function of their height. We emphasize that our processes are less damaging for the nanostructures, in comparison with samples prepared by high vacuum deposition followed by lithography. This is because our magnetic nanostructures are electrodeposited after the whole lithographic process. ©1998 American Institute of Physics.
History: Received 27 January 1998; accepted 24 August 1998
Permalink: http://link.aip.org/link/?JAPIAU/84/6359/1
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KEYWORDS and PACS

Keywords
PACS
  • 75.50.Kj
    Magnetic properties and materials Studies of specific magnetic materials Amorphous and nanocrystalline magnetic materials; quasicrystals
  • 81.05.Ys
    Materials science Specific materials: fabrication, treatment, testing, and analysis Nanophase materials
  • 75.70.Cn
    Magnetic properties and materials Magnetic films and multilayers Interfacial magnetic properties (multilayers, magnetic quantum wells, superlattices, magnetic heterostructures)
  • 81.15.Pq
    Materials science Methods of deposition of films and coatings; film growth and epitaxy Electrodeposition, electroplating
  • YEAR: 1998

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
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REFERENCES (25)
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  1. K. Derbyshire and E. Korczynski, Solid State Technol. 38, 57 (1995).
  2. S. Y. Chou, Proc. IEEE 85, 652 (1997).
  3. J. Smits, Phys. World, November, 48 (1992).
  4. W. P. Pratt, S. F. Lee, R. Loloee, P. A. Schroeder, and J. Bass, Phys. Rev. Lett. 66, 3060 (1991).
  5. Q. Yang, P. Holody, R. Loloee, L. L. Henry, W. P. Pratt, P. A. Schroeder, and J. Bass, Phys. Rev. B 51, 3226 (1995).
  6. L. Piraux, S. Dubois, C. Marchal, J. M. Beuken, L. Filipozzi, J. F. Despres, K. Ounadjela, and A. Fert, J. Magn. Magn. Mater. 156, 317 (1996).
  7. T. Valet and A. Fert, Phys. Rev. B 48, 7099 (1993);
    8. A. Fert, J. L. Duvail, and T. Valet, 52, 6513 (1995).
  8. A. Fert and S. F. Lee, Phys. Rev. B 53, 6554 (1996).
  9. J. C. Slonczewski, J. Magn. Magn. Mater. 159, L1 (1996).
  10. L. Berger, Phys. Rev. B 54, 9353 (1996).
  11. M. A. M. Gijs, S. K. J. Lenczowski, and J. B. Giesbers, Phys. Rev. Lett. 70, 3343 (1993).
  12. W. Vavra, S. F. Cheng, A. Fink, J. J. Krebs, and G. A. Prinz, Appl. Phys. Lett. 66, 2579 (1995).
  13. J. P. Spallas, Y. Huai, S. Vernon, B. Fuchs, B. Law, D. R. Kania, D. Kroes, M. Thomas, D. O'Kane, and Z. C. H. Tan, IEEE Trans. Magn. 32, 4710 (1996);
    14. J. P. Spallas, M. Mao, B. Law, F. Grabner, D. O'Kane, and C. Cerjan, 33 3391 (1997).
  14. L. Piraux, J. M. George, J. F. Despres, C. Leroy, E. Ferain, R. Legras, K. Ounadjela, and A. Fert, Appl. Phys. Lett. 65, 2484 (1994).
  15. A. Blondel, J. P. Meier, B. Doudin, and J. P. Ansermet, Appl. Phys. Lett. 65, 3019 (1994).
  16. S. Dubois, C. Marchal, J. M. Beuken, L. Piraux, J. L. Duvail, A. Fert, J. M. George, and J. L. Maurice, Appl. Phys. Lett. 70, 396 (1997).
  17. P. M. Levy, S. Zhang, T. Ono, and T. Shinjo, Phys. Rev. B 52, 16049 (1995).
    18. It has to be mentioned that the Philips group has also improved the perpendicular component of the current by etching a trench in the strips. For more details, see S. K. J. Lenczowski, R. J. M. van de Veerdonk, M. A. M. Gijs, J. B. Giesbers, and H. H. J. M. Janssen, J. Appl. Phys. 75, 5154 (1994).
  18. M. A. M. Gijs, J. B. Giesbers, S. K. J. Lenczowski, and H. H. J. M. Janssen, Appl. Phys. Lett. 63, 111 (1993).
  19. F. Rousseaux, D. Decanini, F. Carcenac, E. Cambril, M. F. Ravet, C. Chappert, N. Bardou, B. Bartenlian, and P. Veillet, J. Vac. Sci. Technol. B 13, 2787 (1995).
  20. M. Hehn, K. Ounadjela, J. P. Bucher, F. Rousseaux, D. Decanini, B. Bartenlian, and C. Chappert, Science 272, 1782 (1996).
  21. C. Miramond, C. Fermon, F. Rousseaux, D. Decanini, and F. Carcenac, J. Magn. Magn. Mater. 165, 500 (1997).
  22. J. F. Smyth, S. Schultz, D. R. Fredkin, D. P. Kern, S. A. Rishton, H. Schmid, M. Cali, and T. R. Koehler, IEEE Trans. Magn. 27, 5187 (1991).
  23. R. M. H. New, R. F. W. Pease, and R. L. White, J. Vac. Sci. Technol. B 12, 3196 (1994).
  24. P. R. Krauss, P. B. Fischer, and S. Y. Chou, J. Vac. Sci. Technol. B 12, 3639 (1994).
  25. J. O. Dukovic, IBM J. Res. Dev. 34, 693 (1990);
    26. see also Comprehensive Treatise of Electrochemistry, Vol. 6, edited by E. Yeager, J. O'M Bockris, B. E. Conway, and S. Sarangapani (Plenum, New York, 1983).

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