Size effect and fatigue mechanism in ferroelectric thin films
J. Appl. Phys. 92, 4594 (2002); doi:10.1063/1.1506193
Issue Date: 15 October 2002
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Ferroelectric thin films such as barium strontium titanate (BST) and lead zirconate titanate (PZT) are potential materials for high-density dynamic/ferroelectric random-access memory applications. However, the properties of BST and PZT thin films are observed to be significantly inferior to their bulk counterparts. In addition, ferroelectric PZT films, when configured with metal electrodes, generally experience loss of switchable polarization (fatigue) under repetitive electrical cycling. We have reported previously that an interfacial defect layer was observed in BST/Pt interfaces. In this article, we discussed the possible origin of the interfacial defect layer and the effect it has on the thickness-dependent properties. We further suggested that fatigue in ferroelectrics could be explained by a field screening mechanism in which only a small fraction of the applied voltage is seen by the film bulk due to the screening effect of the interfacial layers. ©2002 American Institute of Physics.
| History: | Received 4 March 2002; accepted 17 July 2002 |
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KEYWORDS and PACS
- 77.80.-e
Dielectrics, piezoelectrics, and ferroelectrics and their properties Ferroelectricity and antiferroelectricity - 77.84.Dy
Dielectrics, piezoelectrics, and ferroelectrics and their properties Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials Niobates, titanates, tantalates, PZT ceramics, etc. - 77.55.+f
Dielectrics, piezoelectrics, and ferroelectrics and their properties Dielectric thin films - YEAR: 2002
RELATED DATABASES
PUBLICATION DATA
0021-8979 (print)
1089-7550 (online)
REFERENCES (47)
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- A. I. Kingon, S. K. Streiffer, C. Basceri, and S. R. Summerfelt,
MRS Bull. 21, 46 (1996) . - A. I. Kingon, J. P. Maria, and S. K. Streiffer,
Nature (London) 406, 1032 (2000) . - J. F. Scott and C. A. P. de Araujo,
Science 246, 1400 (1989) . - O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51, 22 (1998).
- T. W. Shaw, S. Trolier-McKinstry, and P. C. McIntyre,
Annu. Rev. Mater. Sci. 30, 263 (2000) . - W. J. Merz, J. Appl. Phys. 27, 938 (1956).
- H. Schlosser and M. E. Drougard, J. Appl. Phys. 32, 1227 (1961).
- C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser, J. Appl. Phys. 82, 2497 (1997).
- S. K. Streiffer, C. Basceri, C. B. Parker, S. E. Lash, and A. I. Kingon, J. Appl. Phys. 86, 4565 (1999).
- P. K. Larsen, G. J. M. Dormans, D. Taylor, and P. V. Veldhoven, J. Appl. Phys. 76, 2405 (1994).
- C. Zhou and D. M. Newns, J. Appl. Phys. 82, 3081 (1997).
- I. Levin, R. D. Leapman, D. L. Kaiser, P. C. van Buskirk, S. Bilodeau, and R. Carl, Appl. Phys. Lett. 75, 1299 (1999).
- D. E. Kotecki et al.,
IBM J. Res. Dev. 43, 367 (1999) . - J. J. Lee, C. L. Thio, and S. B. Desu, J. Appl. Phys. 78, 5073 (1995).
- H. Z. Jin, J. Zhu, P. Ehrhart, F. Fitsilis, C. L. Jia, S. Regnery, K. Urban, and R. Waser (unpublished).
- W. L. Warren, D. Dimos, and R. M. Waser,
MRS Bull. 21, 40 (1996) . - E. Fatuzzo and W. J. Merz, Ferroelectricity (North-Holland, Amsterdam, 1967).
- C. B. Eom, R. B. van Dover, J. M. Phillips, D. J. Werder, J. H. Marshall, C. H. Chen, R. J. Cava, R. M. Fleming, and D. K. Fork, Appl. Phys. Lett. 63, 2570 (1993).
- R. Ramesh et al., Appl. Phys. Lett. 61, 1537 (1992).
- R. Ramesh, H. Gilchrist, T. Sands, V. G. Keramidas, R. Haakenaasen, and D. K. Fork, Appl. Phys. Lett. 63, 3592 (1993).
- C. A. P. de Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott,
Nature (London) 374, 627 (1995) . - H. N. Al-Shareef, D. Dimos, T. J. Boyle, W. L. Warren, and B. A. Tuttle, Appl. Phys. Lett. 68, 690 (1996).
- M. Dawber and J. F. Scott, Appl. Phys. Lett. 76, 1060 (2000).
- J. F. Scott and M. Dawber, Appl. Phys. Lett. 76, 3801 (2000).
- J. F. Scott and M. Dawber,
J. Phys. IV 11, 9 (2001) . - R. J. D. Tilley,
J. Solid State Chem. 21, 293 (1977) . - K. Abe and S. Komatsu,
Jpn. J. Appl. Phys., Part 2 32, L1157 (1993) . - C. S. Hwang, B. T. Lee, C. S. Kang, K. H. Lee, H. J. Cho, H. Hideki, W. D. Kim, S. I. Lee, and M. Y. Lee, J. Appl. Phys. 85, 287 (1999).
- K. Hieda et al., Proceedings of the International Electronic Devices Meeting 1998, pp. 807810.
- R. Williams,
J. Phys. Chem. Solids 26, 399 (1965) . - P. Glogar and V. Janovec,
Czech. J. Phys., Sect. B 13, 261 (1963) . - J. F. M. Cillessen, M. W. J. Prins, and R. M. Wolf, J. Appl. Phys. 81, 2777 (1997).
- J. S. Wu, C. L. Jia, K. Urban, J. H. Hao, and X. X. Xi, J. Appl. Phys. 89, 5653 (2001).
- J. Zhu, X. Zhang, Y. Zhu, and S. B. Desu, J. Appl. Phys. 83, 1610 (1998).
- B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo,
Nature (London) 401, 682 (1999) . - S. E. Cummins, J. Appl. Phys. 35, 3045 (1964).
- B. H. Park, S. J. Hyun, S. D. Bu, T. W. Noh, J. Lee, H. D. Kim, T. H. Kim, and W. Jo, Appl. Phys. Lett. 74, 1907 (1999).
- B. S. Kang, B. H. Park, S. D. Bu, S. H. Kang, and T. W. Noh, Appl. Phys. Lett. 75, 2644 (1999).
- M. Yamaguchi, K. Kawanabe, T. Nagatomo, and O. Omoto,
Mater. Sci. Eng., B 41, 138 (1996) . - J. Robertson, C. W. Chen, W. L. Warren, and C. D. Gutleben, Appl. Phys. Lett. 69, 1704 (1996).
- Y. Yan, M. M. Al-Jassim, Z. Xu, X. Lu, D. Viehland, and M. Payne, Appl. Phys. Lett. 75, 1961 (1999).
- C. F. Pulvari and J. R. Srour,
IEEE Trans. Electron Devices 16, 532 (1969) . - T. Watanabe, H. Funakubo, and K. Saito,
J. Mater. Res. 16, 303 (2001) . - T. Watanabe, A. Saiki, K. Saito, and H. Funakubo, J. Appl. Phys. 89, 3934 (2001).
- A. M. Bratkovsky and A. P. Levanyuk, Phys. Rev. Lett. 84, 3177 (2000).
- Y. A. Boikov, B. M. Goltsman, V. K. Yarmarkin, and V. V. Lemanov, Appl. Phys. Lett. 78, 3866 (2001).
- I. Stolichnov and A. Tagantsev, J. Appl. Phys. 84, 3216 (1998).







