Journal of Applied Physics
Search:
   
 
 
 
Previous Article
Dielectric-spontaneous polarization versus electron emission in perovskite cathodes
Strong electron emission in ferroelectric cathodes requires fast polarization change. We present the correlation between the emission of energetic electrons and the polarization change obtained experi...
Next Article
Structural and electrical properties of homologous Srm–3Bi4TimO3m + 3 (m = 3,4,5, and 6) thin films
Polycrystalline thin films of Bi-layered Srm–3Bi4TimO3m + 3 (referred to as BTO for m = 3 and SBTim for m = 4,5, and 6 respectively) were fabricated on Pt-coated silicon substrates by pulsed lase...

Size effect and fatigue mechanism in ferroelectric thin films

J. Appl. Phys. 92, 4594 (2002); doi:10.1063/1.1506193

Issue Date: 15 October 2002

You are not logged in to this journal. Log in

H. Z. Jin and Jing Zhu
Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
Ferroelectric thin films such as barium strontium titanate (BST) and lead zirconate titanate (PZT) are potential materials for high-density dynamic/ferroelectric random-access memory applications. However, the properties of BST and PZT thin films are observed to be significantly inferior to their bulk counterparts. In addition, ferroelectric PZT films, when configured with metal electrodes, generally experience loss of switchable polarization (fatigue) under repetitive electrical cycling. We have reported previously that an interfacial defect layer was observed in BST/Pt interfaces. In this article, we discussed the possible origin of the interfacial defect layer and the effect it has on the thickness-dependent properties. We further suggested that fatigue in ferroelectrics could be explained by a field screening mechanism in which only a small fraction of the applied voltage is seen by the film bulk due to the screening effect of the interfacial layers. ©2002 American Institute of Physics.
History: Received 4 March 2002; accepted 17 July 2002
Permalink: http://link.aip.org/link/?JAPIAU/92/4594/1
BUY THIS ARTICLE   (US$24)
Download HTML Download Sectioned HTML Download PDF (160 kB) View Cart

KEYWORDS and PACS

Keywords
PACS
  • 77.80.-e
    Dielectrics, piezoelectrics, and ferroelectrics and their properties Ferroelectricity and antiferroelectricity
  • 77.84.Dy
    Dielectrics, piezoelectrics, and ferroelectrics and their properties Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials Niobates, titanates, tantalates, PZT ceramics, etc.
  • 77.55.+f
    Dielectrics, piezoelectrics, and ferroelectrics and their properties Dielectric thin films
  • YEAR: 2002

RELATED DATABASES


To view database links for this article,
you need to log in.
To view database links for this article,
you need to log in.

PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (47)

For access to fully linked references, you need to log in. For access to fully linked references, you need to Log in.
  1. A. I. Kingon, S. K. Streiffer, C. Basceri, and S. R. Summerfelt, MRS Bull. 21, 46 (1996).
  2. A. I. Kingon, J. P. Maria, and S. K. Streiffer, Nature (London) 406, 1032 (2000).
  3. J. F. Scott and C. A. P. de Araujo, Science 246, 1400 (1989).
  4. O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51, 22 (1998).
  5. T. W. Shaw, S. Trolier-McKinstry, and P. C. McIntyre, Annu. Rev. Mater. Sci. 30, 263 (2000).
  6. W. J. Merz, J. Appl. Phys. 27, 938 (1956).
  7. H. Schlosser and M. E. Drougard, J. Appl. Phys. 32, 1227 (1961).
  8. C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser, J. Appl. Phys. 82, 2497 (1997).
  9. S. K. Streiffer, C. Basceri, C. B. Parker, S. E. Lash, and A. I. Kingon, J. Appl. Phys. 86, 4565 (1999).
  10. P. K. Larsen, G. J. M. Dormans, D. Taylor, and P. V. Veldhoven, J. Appl. Phys. 76, 2405 (1994).
  11. C. Zhou and D. M. Newns, J. Appl. Phys. 82, 3081 (1997).
  12. I. Levin, R. D. Leapman, D. L. Kaiser, P. C. van Buskirk, S. Bilodeau, and R. Carl, Appl. Phys. Lett. 75, 1299 (1999).
  13. D. E. Kotecki et al., IBM J. Res. Dev. 43, 367 (1999).
  14. J. J. Lee, C. L. Thio, and S. B. Desu, J. Appl. Phys. 78, 5073 (1995).
  15. H. Z. Jin, J. Zhu, P. Ehrhart, F. Fitsilis, C. L. Jia, S. Regnery, K. Urban, and R. Waser (unpublished).
  16. W. L. Warren, D. Dimos, and R. M. Waser, MRS Bull. 21, 40 (1996).
  17. E. Fatuzzo and W. J. Merz, Ferroelectricity (North-Holland, Amsterdam, 1967).
  18. C. B. Eom, R. B. van Dover, J. M. Phillips, D. J. Werder, J. H. Marshall, C. H. Chen, R. J. Cava, R. M. Fleming, and D. K. Fork, Appl. Phys. Lett. 63, 2570 (1993).
  19. R. Ramesh et al., Appl. Phys. Lett. 61, 1537 (1992).
  20. R. Ramesh, H. Gilchrist, T. Sands, V. G. Keramidas, R. Haakenaasen, and D. K. Fork, Appl. Phys. Lett. 63, 3592 (1993).
  21. C. A. P. de Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott, Nature (London) 374, 627 (1995).
  22. H. N. Al-Shareef, D. Dimos, T. J. Boyle, W. L. Warren, and B. A. Tuttle, Appl. Phys. Lett. 68, 690 (1996).
  23. M. Dawber and J. F. Scott, Appl. Phys. Lett. 76, 1060 (2000).
  24. J. F. Scott and M. Dawber, Appl. Phys. Lett. 76, 3801 (2000).
  25. J. F. Scott and M. Dawber, J. Phys. IV 11, 9 (2001).
  26. R. J. D. Tilley, J. Solid State Chem. 21, 293 (1977).
  27. K. Abe and S. Komatsu, Jpn. J. Appl. Phys., Part 2 32, L1157 (1993).
  28. C. S. Hwang, B. T. Lee, C. S. Kang, K. H. Lee, H. J. Cho, H. Hideki, W. D. Kim, S. I. Lee, and M. Y. Lee, J. Appl. Phys. 85, 287 (1999).
  29. K. Hieda et al., Proceedings of the International Electronic Devices Meeting 1998, pp. 807–810.
  30. R. Williams, J. Phys. Chem. Solids 26, 399 (1965).
  31. P. Glogar and V. Janovec, Czech. J. Phys., Sect. B 13, 261 (1963).
  32. J. F. M. Cillessen, M. W. J. Prins, and R. M. Wolf, J. Appl. Phys. 81, 2777 (1997).
  33. J. S. Wu, C. L. Jia, K. Urban, J. H. Hao, and X. X. Xi, J. Appl. Phys. 89, 5653 (2001).
  34. J. Zhu, X. Zhang, Y. Zhu, and S. B. Desu, J. Appl. Phys. 83, 1610 (1998).
  35. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, Nature (London) 401, 682 (1999).
  36. S. E. Cummins, J. Appl. Phys. 35, 3045 (1964).
  37. B. H. Park, S. J. Hyun, S. D. Bu, T. W. Noh, J. Lee, H. D. Kim, T. H. Kim, and W. Jo, Appl. Phys. Lett. 74, 1907 (1999).
  38. B. S. Kang, B. H. Park, S. D. Bu, S. H. Kang, and T. W. Noh, Appl. Phys. Lett. 75, 2644 (1999).
  39. M. Yamaguchi, K. Kawanabe, T. Nagatomo, and O. Omoto, Mater. Sci. Eng., B 41, 138 (1996).
  40. J. Robertson, C. W. Chen, W. L. Warren, and C. D. Gutleben, Appl. Phys. Lett. 69, 1704 (1996).
  41. Y. Yan, M. M. Al-Jassim, Z. Xu, X. Lu, D. Viehland, and M. Payne, Appl. Phys. Lett. 75, 1961 (1999).
  42. C. F. Pulvari and J. R. Srour, IEEE Trans. Electron Devices 16, 532 (1969).
  43. T. Watanabe, H. Funakubo, and K. Saito, J. Mater. Res. 16, 303 (2001).
  44. T. Watanabe, A. Saiki, K. Saito, and H. Funakubo, J. Appl. Phys. 89, 3934 (2001).
  45. A. M. Bratkovsky and A. P. Levanyuk, Phys. Rev. Lett. 84, 3177 (2000).
  46. Y. A. Boikov, B. M. Goltsman, V. K. Yarmarkin, and V. V. Lemanov, Appl. Phys. Lett. 78, 3866 (2001).
  47. I. Stolichnov and A. Tagantsev, J. Appl. Phys. 84, 3216 (1998).

CITING ARTICLES

For access to citing articles, you need to log in.
For access to citing articles, you need to Log in.