Large enhancement of coercivity of magnetic Co/Pt nanodots with perpendicular anisotropy
J. Appl. Phys. 101, 09J101 (2007); doi:10.1063/1.2711281
Published 10 April 2007
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Nanodots consisting of Co/Pt multilayer have been fabricated using nanosphere lithography and ion beam etching. The nanodots retained the perpendicular anisotropy as that of the continuous films. However, the coercivity of the nanodots was greatly enhanced, more substantially for smaller nanodots. Concurrently, the remnant magnetization was reduced to 50%–80%. Magnetic force microscopy revealed that the domain pattern of nanodots at the remnant state was largely single domain but with nonperpendicular stray fields on the edges, indicating noncollinear alignment of magnetizations in those regions.
©2007 American Institute of Physics
| History: | Presented 9 January 2007; received 31 October 2006; accepted 12 December 2006; published 10 April 2007 |
| Permalink: |
http://link.aip.org/link/?JAPIAU/101/09J101/1 |
KEYWORDS and PACS
cobalt,
platinum,
ferromagnetic materials,
nanostructured materials,
magnetic multilayers,
nanolithography,
etching,
perpendicular magnetic anisotropy,
magnetic force microscopy,
remanence,
coercive force
- 75.70.Cn
Magnetic properties of interfaces (multilayers, superlattices, heterostructures) - 75.30.Gw
Magnetic anisotropy - 75.60.Ej
Magnetization curves, hysteresis, Barkhausen and related effects - 75.50.Tt
Fine-particle magnetic systems; nanocrystalline materials - 81.16.Nd
Nanolithography in nanofabrication and processing - 81.65.Cf
Surface cleaning, etching, patterning - YEAR: 2007
RELATED DATABASES
PUBLICATION DATA
0021-8979 (print)
1089-7550 (online)
REFERENCES (13)
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- T. Shinjo et al.,
Science 289, 930 (2000) . - A. Wachowiak et al.,
Science 298, 577 (2002) . - R. P. Cowburn, A. O. Adeyeye, and M. E. Welland, Phys. Rev. Lett. 81, 5414 (1998).
- H. F. Ding et al., Phys. Rev. Lett. 94, 157202 (2005).
- H. Masuda, K. Yasui, and K. Nishio,
Adv. Mater. (Weinheim, Ger.) 12, 1031 (2000) . - J. Moritz et al., J. Appl. Phys. 91, 7314 (2002).
- M. T. Bryan, D. Atkinson, and R. P. Cowburn, Appl. Phys. Lett. 85, 3510 (2004).
- T. Ono, H. Miyajima, K. Shigeto, and T. Shinjo,
J. Magn. Magn. Mater. 198–199, 225 (1999) . - F. Q. Zhu et al., Phys. Rev. Lett. 96, 27205 (2006).
- F. Q. Zhu et al.,
Adv. Mater. (Weinheim, Ger.) 16, 2155 (2004) . - AFM/MFM User's Guide (Veeco, Woodbury, NY, 2001).
- F. Q. Zhu and C. L. Chien, J. Appl. Phys. 97, 10J110 (2005).
- S. E. Russek and W. E. Bailey,
IEEE Trans. Magn. 36, 2990 (2000) .







