Annealing induced transition of flat strained InGaAs epilayers into three-dimensional islands
J. Appl. Phys. 101, 106106 (2007); doi:10.1063/1.2736637
Published 25 May 2007
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We report arrays of self-assembled quantum dots through roughening transition of strained but atomically flat layers into three-dimensional (3D) islands. Atomically flat two-dimensional InGaAs epilayers were grown on GaAs(001) substrates below 360 °C. When heated higher than 420 °C, they were observed to undergo roughening transitions. The morphology, height, and width of the resultant 3D features were found to be a strong function of the annealing time and temperature. Furthermore, at a particular set of parameters, dot chains were observed. The strain field of the flat layer seemed uniform in the roughening stage, but appeared to induce anisotropic diffusion at the subsequent growth stage.
©2007 American Institute of Physics
| History: | Received 19 February 2007; accepted 31 March 2007; published 25 May 2007 |
| Permalink: |
http://link.aip.org/link/?JAPIAU/101/106106/1 |
KEYWORDS and PACS
indium compounds,
semiconductor epitaxial layers,
gallium arsenide,
III-V semiconductors,
island structure,
semiconductor quantum dots,
self-assembly,
annealing,
diffusion,
semiconductor growth,
solid-state phase transformations
- 64.70.Kb
Solid–solid transitions - 81.05.Ea
III–V semiconductors: fabrication, treatment, testing and analysis - 61.72.Cc
Kinetics of defect formation and annealing - 68.65.Hb
Quantum dots (structure and nonelectronic properties) - 81.07.Ta
Quantum dots: fabrication and characterization - 66.30.Hs
Self-diffusion and ionic conduction in solid nonmetals - YEAR: 2007
RELATED DATABASES
PUBLICATION DATA
0021-8979 (print)
1089-7550 (online)
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