Arsenic dependence on the morphology of ultrathin GaAs layers on In0.53Ga0.47As/InP(001)
J. Appl. Phys. 103, 104309 (2008); doi:10.1063/1.2917276
Published 27 May 2008
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Thin GaAs films grown on lattice-matched In0.53Ga0.47As/InP(001) have been imaged by in vacuo scanning tunneling microscopy. We observe that the morphological evolution of these strained films depends on the deposition and diffusion of group III adatoms and the incorporation of As from the vapor, in addition to Asaro–Tiller–Grinfeld instabilities. We compare step edge densities to a model for the Ga adatom density and find that the absolute magnitude of the group V and group III fluxes has a strong effect on the number of adatoms on the surface and, thus, the morphology of the films.
©2008 American Institute of Physics
| History: | Received 7 February 2008; accepted 3 March 2008; published 27 May 2008 |
| Permalink: |
http://link.aip.org/link/?JAPIAU/103/104309/1 |
KEYWORDS and PACS
crystal growth from solution,
diffusion,
gallium arsenide,
III-V semiconductors,
indium compounds,
scanning tunnelling microscopy,
semiconductor growth,
semiconductor thin films,
surface morphology,
vapour deposition
- 68.55.ag
Semiconductor thin film nucleation and growth - 68.37.Ef
Scanning tunneling microscopy of surfaces, interfaces and thin films - 81.16.Ta
Atom manipulation in nanofabrication and processing - 81.10.Bk
Crystal growth from vapor - 81.10.Dn
Crystal growth from solutions - 81.15.-z
Methods of deposition of films and coatings - YEAR: 2008
RELATED DATABASES
PUBLICATION DATA
0021-8979 (print)
1089-7550 (online)
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