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Nonmagnetic compensation in ferromagnetic Ga1−xMnxAs and Ga1−xMnxP synthesized by ion implantation and pulsed-laser melting

J. Appl. Phys. 103, 123906 (2008); doi:10.1063/1.2940361

Published 18 June 2008

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M. A. Scarpulla,1,2 P. R. Stone,1,2 I. D. Sharp,1,2 E. E. Haller,1,2 O. D. Dubon,1,2 J. W. Beeman,2 and K. M. Yu2
1Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA
2Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
The electronic and magnetic effects of intentional compensation with nonmagnetic donors are investigated in the ferromagnetic semiconductors Ga1−xMnxAs and Ga1−xMnxP synthesized using ion implantation and pulsed-laser melting. It is demonstrated that compensation with nonmagnetic donors and MnI have similar qualitative effects on materials properties. With compensation TC decreases, resistivity increases, and stronger magnetoresistance and anomalous Hall effect attributed to skew scattering are observed. Ga1−xMnxAs can be controllably compensated with Te through a metal-insulator transition through which the magnetic and electrical properties vary continuously. The resistivity of insulating Ga1−xMnxAs:Te can be described by thermal activation to the mobility edge and simply activated hopping transport. Ga1−xMnxP doped with S is insulating at all compositions but shows decreasing TC with compensation. The existence of a ferromagnetic insulating state in Ga1−xMnxAs:Te and Ga1−xMnxP:S having TC's of the same order as the uncompensated materials demonstrates that localized holes are effective at mediating global ferromagnetism in ferromagnetic semiconductors through the percolation of ferromagnetic “puddles” at low temperatures. ©2008 American Institute of Physics
History: Received 5 February 2008; accepted 8 April 2008; published 18 June 2008
Permalink: http://link.aip.org/link/?JAPIAU/103/123906/1
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KEYWORDS and PACS

Keywords
PACS
  • 72.20.My
    Galvanomagnetic and other magnetotransport effects (semiconductors/insulators)
  • 72.20.Ee
    Mobility edges; hopping transport (semiconductors/insulators)
  • 73.50.Dn
    Low-field transport and mobility; piezoresistance (thin films)
  • 75.50.Pp
    Magnetic semiconductors
  • 72.20.Fr
    Low-field transport and mobility; piezoresistance (semiconductors/insulators)
  • YEAR: 2008

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
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