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Capacitance hysteresis in GaN/AlGaN heterostructures

J. Appl. Phys. 105, 023709 (2009); doi:10.1063/1.3068179

Published 26 January 2009

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L. E. Byrum,1 G. Ariyawansa,1 R. C. Jayasinghe,1 N. Dietz,1 A. G. U. Perera,1 S. G. Matsik,2 I. T. Ferguson,3 A. Bezinger,4 and H. C. Liu4
1Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303, USA
2NDP Optronics LLC, Mableton, Georgia 30126, USA
3School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30032, USA
4Institute for Microstructural Sciences, National Research Council, Ottawa K1A 0R6, Canada

Capacitance characteristics with voltage and frequency of n+-GaN/AlxGa1−xN heterojunction ultraviolet (UV)-infrared (IR) photodetectors are reported. A distinct capacitance step and capacitance hysteresis have been attributed to trap energy states located just above the Fermi level at the GaN/AlGaN interface, most likely due to N-vacancy and/or C-donor impurities. The presence of the hysteresis is due to the accumulation of charge at the heterointerface, which is dependent on the location of the continuum of interface trap states relative to the Fermi level. The Al fraction in the barrier layer has been found to significantly change the positions of the interface trap states relative to the Fermi level. ©2009 American Institute of Physics
History: Received 9 September 2008; accepted 3 December 2008; published 26 January 2009
Permalink: http://link.aip.org/link/?JAPIAU/105/023709/1
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KEYWORDS and PACS

Keywords
PACS
  • 73.40.Kp
    Electrical properties of III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions
  • 71.20.Nr
    Electronic structure of crystalline semiconductor compounds
  • 73.20.At
    Surface states, band structure, electron density of states
  • 61.72.jd
    Vacancies (point defects)
  • YEAR: 2009

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PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
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REFERENCES (12)

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