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Initial growth process of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition

J. Appl. Phys. 106, 094302 (2009); doi:10.1063/1.3253734

Published 5 November 2009

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Shingo Kondo,1 Shinji Kawai,1 Wakana Takeuchi,1 Koji Yamakawa,2 Shoji Den,2 Hiroyuki Kano,3 Mineo Hiramatsu,4 and Masaru Hori1
1Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
2Katagiri Engineering Co., Ltd., 3-5-34 Shitte, Tsurumi-ku, Yokohama 230-0003, Japan
3NU-Eco Engineering Co., Ltd., 1237-87 Umazutsumi, Kurozasa, Miyoshi-cho, Aichi 470-0201, Japan
4Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan

We synthesized carbon nanowalls (CNWs) using radical injection plasma-enhanced chemical vapor deposition. The initial growth process of CNWs was investigated with and without O2 gas addition to a C2F6 capacitively coupled plasma with H radical injection. In the case of the CNW synthesis without the addition of O2 gas, scanning electron microscopy (SEM), transmission electron microscopy, x-ray photoelectron spectroscopy (XPS), and Raman spectroscopy revealed that a 10-nm-thick interface layer composed of nanoislands was formed on a Si substrate approximately 1 min prior to CNW formation. In contrast, with O2 gas addition, SEM and XPS revealed that an interface layer was not formed and that CNWs were grown directly from nanoislands. Moreover, Raman spectroscopy suggested that the interface layer was composed of amorphous carbon and that O2 gas addition during CNW growth is effective for achieving a high graphitization of CNWs. Therefore, O2 gas addition has the effect of reducing the amorphicity and disorder of CNWs and controlling CNW nucleation. ©2009 American Institute of Physics
History: Received 27 July 2009; accepted 26 September 2009; published 5 November 2009
Permalink: http://link.aip.org/link/?JAPIAU/106/094302/1
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KEYWORDS and PACS

Keywords
PACS
  • 81.16.-c
    Methods of nanofabrication and processing
  • 61.46.-w
    Structure of nanoscale materials
  • 81.15.Gh
    Chemical vapor deposition
  • 78.30.Hv
    Infrared and Raman spectra in nonmetallic inorganics
  • 79.60.Jv
    Photoelectron spectra of interfaces; heterostructures; nanostructures
  • 78.67.-n
    Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures
  • YEAR: 2009

PUBLICATION DATA

ISSN:
0021-8979 (print)   1089-7550 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (14)

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